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LENS HEATING COMPENSATION SYSTEMS AND METHODS

  • US 20140047397A1
  • Filed: 10/28/2013
  • Published: 02/13/2014
  • Est. Priority Date: 06/03/2008
  • Status: Active Grant
First Claim
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1. A method for performing optical proximity correction (OPC) on a target design for a lithographic process comprising:

  • obtaining a lens heating model that accounts for effects of lens heating in the lithographic process;

    obtaining a set of process window conditions associated with the lithographic process;

    determining pattern failures across the set of process window conditions using the lens heating model; and

    performing OPC on the target design based on the determined pattern failures.

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