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Apparatus for Cleaning a Semiconductor Substrate

  • US 20140059789A1
  • Filed: 10/16/2013
  • Published: 03/06/2014
  • Est. Priority Date: 12/30/2005
  • Status: Abandoned Application
First Claim
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1. An apparatus for processing a substrate, comprising:

  • a solid material having a support side and a contact side, the contact side having an outer surface, the outer surface configured to become softer relative to a remainder of the solid material when exposed to an activation solution;

    a support structure configured to support the solid material from the support side of the solid material, such that the contact side of the solid material is oriented to face a surface of the substrate, when the substrate is present;

    a gimbaled structure connected to the support structure, the gimbaled structure enabling the outer surface of the contact side to substantially align in a coplanar arrangement with the surface of the substrate, when the substrate is present; and

    a force application structure coupled to the gimbaled structure, the force application structure configured for moving of the solid material toward and away from the surface of the substrate, when the substrate is present, and further configured for applying a force that presses the outer surface of the solid material against the surface of the substrate, when the substrate is present.

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