ELECTROSTATIC CHUCK WITH RADIATIVE HEATING

• US 20140061180A1
• Filed: 09/05/2012
• Published: 03/06/2014
• Est. Priority Date: 09/05/2012
• Status: Active Grant

• Current Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Original Assignee: Varian Semiconductor Equipment Associates Incorporated (Applied Materials Incorporated)
• Inventors: Petry, Klaus, Carroll, James
• Granted Patent: US 8,987,639 B2
• Time in Patent Office: Days
• US Class Current: 219/201
• CPC Class Codes: H01L 21/67115 mainly by radiation
• CPC Class Codes: H01L 21/6831 using electrostatic chucks
• CPC Class Codes: H01L 21/68757 characterised by a coating or a hardness or a material
• CPC Class Codes: H05B 3/0047 for semiconductor manufacture

Abstract

An electrostatic chuck is formed using materials that are optically transparent to a range of frequencies, such as infrared radiation. The invention discloses several methods for achieving optical transparency. The chuck electrode can be formed having a mesh pattern designed with a specific open area percentage to provide adequate wafer clamping force while still allowing sufficient levels of infrared radiation to pass through. Alternatively, the chuck electrode can also be made from a transparent conductive film. A workpiece is disposed on one surface of the chuck, and a radiative heat source is positioned on the opposite side of the chuck. A reflector plate may be used to reflect the infrared radiation toward the chuck and the wafer. The spacing of the radiation sources and the shape of the reflector plate may be modified to focus more radiation on a particular portion of the workpiece if desired.

Claims

1. A system for holding and heating a workpiece, comprising:

an electrostatic chuck, having a first surface for supporting said workpiece clamped to said first surface and a second surface opposite said first surface; and

one or more radiative heat sources proximate said second surface of said electrostatic chuck, emitting radiative heat within a predetermined frequency range, wherein said electrostatic chuck is comprised of a material that is optically transparent to at least a portion of said predetermined frequency range.

2. The system of claim 1, wherein the material is selected from the group consisting of quartz, glass and sapphire.

3. The system of claim 1, wherein said electrostatic chuck comprises an insulating layer and a dielectric layer, and wherein an electrically conductive pattern is embedded in a surface of said insulating layer.

4. The system of claim 3, wherein said electrically conductive pattern is a mesh formed of channels, with an electrically conductive material disposed in said channels, said channels spaced apart to provide a sufficiently large open area for said radiative heat to pass through, wherein the channels occupy less than about 20% of an area of said surface of said insulating layer.

5. The system of claim 4, wherein said mesh comprises an axial component and a radial component and said radial component is unequally spaced, thereby allowing more radiative heat to be able to pass through a portion of said pattern.

6. The system of claim 3, wherein said electrically conductive pattern is formed of a material that is optically transparent to at least a portion of said predetermined frequency range.

7. The system of claim 6, wherein said material is selected from the group consisting of transparent conductive oxide (TCO) film and graphene.

8. The system of claim 1, further comprising a reflector plate such that said one or more radiative heat sources is disposed between said reflector plate and said electrostatic chuck.

9. The system of claim 8, wherein said reflector plate is shaped so as to focus said radiative heat at a portion of said workpiece.

10. The system of claim 1, wherein said radiative heat sources are unequally spaced so as to provide more radiative heat to a portion of said workpiece.

11. The system of claim 1, wherein said predetermined frequency range comprises infrared light.

12. An electrostatic chuck, comprising:

an insulating layer comprising channels in its top surface;

an electrically conductive material disposed in said channels, said electrically conductive material forming a mesh electrode; and

a

dielectric layer deposited on said insulating layer, wherein said insulating layer and said dielectric layer are optically transparent to a predetermined frequency range.

13. The electrostatic chuck of claim 12, wherein said insulating layer comprises a material selected from the group consisting of quartz, glass and sapphire.

14. The electrostatic chuck of claim 12, wherein said dielectric layer comprises glass.

15. The electrostatic chuck of claim 12, wherein said predetermined frequency range comprises infrared light.

16. The electrostatic chuck of claim 12, wherein said pattern comprises an axial component and a radial component and said pattern is created such that said radial component is unequally spaced thereby allowing more light to be able to pass through a portion of said pattern.

17. The electrostatic chuck of claim 12, wherein said electrically conductive material is optically transparent to said frequency range.

18. The electrostatic chuck of claim 17, where said electrically conductive material is selected from the group consisting of a transparent conductive oxide (TCO) film and graphene.

19. The electrostatic chuck of claim 12, wherein said channels are sufficiently thin and spaced apart to allow transmission of at least about 80% of said radiative heat through said chuck.