THIN FILM TRANSISTOR AND METHOD FOR MANUFACTURING THE SAME
First Claim
1. A method for manufacturing a thin film transistor, comprising:
- forming a gate electrode on a substrate;
forming an active layer that is adjacent to the gate electrode and comprises an oxide semiconductor;
forming an oxygen providing layer on the active layer;
forming a gate dielectric between the gate electrode and the active layer;
forming source and drain electrodes coupled to the active layer;
forming a planarizing layer covering the gate electrode and the gate dielectric;
forming a hole exposing the active layer; and
performing a heat treatment process onto the planarizing layer in an atmosphere of oxygen.
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Accused Products
Abstract
Provided are a thin film transistor and a method for manufacturing the same. The thin film transistor manufacturing method includes forming a gate electrode on a substrate, forming an active layer that is adjacent to the gate electrode and includes an oxide semiconductor, forming an oxygen providing layer on the active layer, forming a gate dielectric between the gate electrode and the active layer, forming source and drain electrodes coupled to the active layer, forming a planarizing layer covering the gate electrode and the gate dielectric, forming a hole exposing the active layer, and performing a heat treatment process onto the planarizing layer in an atmosphere of oxygen.
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Citations
14 Claims
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1. A method for manufacturing a thin film transistor, comprising:
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forming a gate electrode on a substrate; forming an active layer that is adjacent to the gate electrode and comprises an oxide semiconductor; forming an oxygen providing layer on the active layer; forming a gate dielectric between the gate electrode and the active layer; forming source and drain electrodes coupled to the active layer; forming a planarizing layer covering the gate electrode and the gate dielectric; forming a hole exposing the active layer; and performing a heat treatment process onto the planarizing layer in an atmosphere of oxygen. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A thin film transistor comprising:
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a gate electrode on a substrate; an active layer disposed to be adjacent to the gate electrode and comprising an oxide semiconductor; an oxygen providing layer on the active layer; a gate dielectric between the gate electrode and the active layer; source and drain electrodes coupled to the active layer; a planarizing layer covering the gate electrode and the gate dielectric; and a hole exposing the active layer. - View Dependent Claims (11, 12, 13, 14)
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Specification