METHOD AND APPARATUS FOR LITHOGRAPHIC MANUFACTURE OF MULTI-COMPONENT POLYMERIC FIBER PLATES

• US 20140093690A1
• Filed: 05/31/2012
• Published: 04/03/2014
• Est. Priority Date: 05/31/2011
• Status: Active Application

• Current Assignee: Nanoptics, Incorporated
• Original Assignee: Nanoptics, Incorporated
• Inventors: Walker, James K., Noh, Youngwook, Farley, Richard T.
• Application Number:
  US13/985,793
• Publication Number:
  US 20140093690A1
• Time in Patent Office: Days
• US Class Current: 428/156
• CPC Class Codes: B01L 3/50857 using arrays or bundles of open capillaries for holding samples
• CPC Class Codes: B33Y 10/00 Processes of additive manufacturing
• CPC Class Codes: B33Y 30/00 Apparatus for additive manufacturing; Details thereof or accessories therefor
• CPC Class Codes: B33Y 70/00 Materials specially adapted for additive manufacturing
• CPC Class Codes: G03F 7/0037 Production of three-dimensional images
• CPC Class Codes: G03F 7/2055 for the production of printing plates; Exposure of liquid photohardening compositions
• CPC Class Codes: Y10T 428/24479 including variation in thickness

Abstract

Embodiments of the invention relate to microfabrication of three dimensional polymeric structures incorporating a large number of identical elements each having one or more materials. In specific embodiments, the structures are large area fiber optic plates and associated structures, wherein the fibers are precisely located relative to each other and can serve as optical readout, such as optical readout for high density microarrays of biomaterial and other chemicals or pharmaceuticals. A three-dimensional fiber optic plate can be fabricated by a lithographic process in which a 2D solid slice is produced by exposing a 2D layer of photocurable liquid to ultraviolet light. The cured layer is lowered and the process is repeated to build the plate layer by layer.

Claims

1. A method for fabricating a polymeric structure, comprising:

exposing a first polymerizable polymer precursor to a patterned beam of light to form a first patterned polymeric layer;

positioning additional first polymerizable polymer precursor adjacent to the first patterned polymeric layer such that exposing the additional first polymeric polymer precursor forms an additional patterned polymeric layer on top of the first polymeric layer;

exposing the additional first polymeric polymer precursor to form the additional patterned polymeric layer on top of the first polymeric layer, wherein the first patterned polymeric layer and the additional patterned polymeric layer form a polymeric structure.

2. The method according to claim 1, further comprising:

positioning further additional first polymerizable polymer precursor adjacent the additional patterned polymeric layer such that exposing the further additional first polymeric precursor forms a further additional patterned polymeric layer on top of the polymeric structure to increase a thickness of the polymeric structure; and

exposing the further additional first polymeric precursor to form a further additional patterned polymeric layer on top of the polymeric structure to increase the thickness of the polymeric structure.

3. The method according to claim 2, further comprising:

a. positioning further additional first polymeric precursor adjacent the further additional patterned polymeric layer such that exposing the further additional first polymeric precursor forms a further additional patterned polymeric layer on top of the polymeric structure to enlarge the polymeric structure; and

b. exposing the further additional first polymeric precursor to form a further additional patterned polymeric layer on top of the polymeric structure to increase the thickness of the polymeric structure.

4. The method according to claim 3, further comprising:

repeating a and b until a desired thickness of the polymeric structure is reached.

5. The method according to claim 4, wherein exposing a first polymerizable polymer precursor to a patterned beam of light to form a first patterned polymeric layer comprises:

exposing a bath of the first polymerizable polymer precursor located on top of a moveable elevator to the patterned beam of light to form the first patterned polymeric layer,

wherein positioning additional first polymerizable polymer precursor adjacent to the first patterned polymeric layer such that exposing the additional first polymeric polymer precursor forms an additional patterned polymeric layer on top of the first polymeric layer comprises;

lowering the movable elevator in the bath of the first polymerizable polymer precursor such that exposing the bath of the first polymerizable polymer precursor with the patterned beam of light forms the additional patterned polymeric layer on top of the first polymeric layer;

wherein positioning further additional first polymerizable polymer precursor adjacent to the additional patterned polymeric layer such that exposing the further additional first polymeric precursor forms a further additional patterned polymeric layer on top of the polymeric structure to increase a thickness of the polymeric structure comprises;

lowering the movable elevator in the bath of the first polymerizable polymer precursor such that exposing the bath of the first polymerizable polymer precursor with the patterned beam of light forms the further additional patterned polymeric layer on top of the polymeric structure,

wherein positioning further additional first polymeric precursor adjacent the further additional patterned polymeric layer such that exposing the further additional first polymeric precursor forms a further additional patterned polymeric layer on top of the polymeric structure to increase the thickness of the polymeric structure comprises;

lowering the movable elevator in the bath of the first polymerizable polymer precursor such that exposing the bath of the first polymerizable polymer precursor with the patterned beam of light forms the further additional patterned polymeric layer on top of the polymeric structure.

6. The method according to claim 5, wherein the polymeric structure has at least one void region, further comprising filling at least a portion of one or more of the at least one void region with a second polymerizable polymeric precursor;

and

polymerizing the second polymerizable polymeric precursor.

7. The method according to claim 6, wherein filling at least a portion of one or more of the at least one void region with the second polymerizable polymeric precursor comprises filling the at least one void region with the second polymerizable polymeric precursor.

8. The method according to claim 7, wherein filling the at least one void region comprises placing the polymeric structure in a heated bath of the second polymerizable polymeric precursor, wherein the second polymerizable polymeric precursor fills the at least one void region of the polymeric structure and is polymerized.

9. The method according to claim 5, further comprising:

washing the polymeric structure to remove unpolymerized material; and

heating the polymeric structure to achieve further polymerization.

10. The method according to claim 8, wherein placing the polymerized structure in a heated bath comprises controlling a temperature cycle of the heated bath via computer.

11. The method according to claim 8, further comprising:

polishing a first end and a second end of the polymeric structure.

12. The method of claim 5, wherein the patterned beam of light comprises light having a wavelength less than 450 nm.

13. The method of claim 5, wherein the patterned beam of light comprises light having a wavelength less than 400 nm.

14. The method of claim 5, wherein the patterned beam of light is formed by traversing light through a partially transparent mask.

15. The method of claim 14, wherein the first polymerizable polymer precursor is in direct contact or in proximal contact with the partially transparent mask.

16. The method of claim 14, wherein a coplanarity of the partially transparent mask with respect to the elevator is controlled to have angular deviations of coplanarity less than 10⁻

3 radians.

17. The method according to claim 16, wherein the coplanarity of the partially transparent mask and the elevator is controlled to have angular deviations of coplanarity less than 2×

10<sup>−

4</sup> radians.

18. The method of claim 14, wherein a gap between the elevator and the partially transparent mask is controlled to be less than 100 microns during providing the patterned beam of light to form the first patterned polymeric layer.

19. The method according to claim 18, wherein the gap is controlled to be less than 50 microns during providing the patterned beam of light to form the first patterned polymeric layer.

20. The method according to claim 18, wherein the gap is controlled to be less than 30 microns during providing the patterned beam of light to form the first patterned polymeric layer.

21. The method of claim 5, wherein the first polymerizable polymer precursor is a photocurable liquid composition.

22. The method according to claim 21, wherein the photocurable liquid composition comprises a mono or multi-functional monomer.

23. The method according to claim 21, wherein the photocurable liquid composition is a homo- or co-polymer.

24. The method according to claim 21, wherein the photocurable liquid composition comprises a photo-initiator.

25. The method according to claim 21, wherein the photocurable liquid composition has dispersed within it a visible light absorbing chemical dopant.

26. The method according to claim 25, wherein the light absorbing chemical dopant controls a curing depth of the photocurable liquid composition.

27. The method according to claim 21, wherein the photocurable liquid composition has dispersed within it a light absorbing chemical dopant, wherein the light absorbing chemical dopant controls cross-talk of light from one of a plurality of component elements of the polymeric structure to another of the plurality of component elements.

28. The method of claim 5, wherein the polymeric structure is washed in a solvent after removing the polymeric structure from the bath of the first polymerizable polymeric precursor.

29. The method according to claim 28, wherein the solvent comprises a liquid selected from the group consisting of methanol, methyl ether ketone, and combinations thereof.

30. The method according to claim 28, wherein the polymeric structure is washed in an ultra-sonic bath.

31. The method of claim 9, wherein heating the polymeric structure comprises placing the polymeric structure in a vacuum oven at a temperature of at least 40°

C. for at least 10 hours, followed by a temperature of at least 60°

C. for at least 24 hours.

32. The method of claim 8, wherein placing the polymeric structure in a heated bath of the a second polymerizable polymeric precursor comprises placing the polymeric structure in a heated ultrasonic bath holding the second polymerizable polymeric precursor.

33. The method according to claim 8, wherein the second polymerizable polymeric precursor is a mono or co-polymeric material.

34. The method according to claim 8, wherein once the second polymerizable polymeric precursor fills the at least one void region in the polymeric structure, further comprising raising a temperature of the heated bath to at least 50°

C. for at least 10 hours; and

raising the temperature of the heated bath to at least 70°

C. for at least 24 hours.

35. The method according to claim 8, further comprising:

wicking the second polymerizable polymer precursor into the at least one void region.

36. The method according to claim 8, further comprising:

applying pressure to fill the at least one void region with the second polymerizable polymer precursor.

37. The method of claim 31, wherein the second polymerizable polymeric precursor has been previously polymerized to a molecular weight up to 5000 to reduce subsequent contraction.

38. The method according to claim 8, wherein the second polymerizable polymeric precursor comprises a mono- or multi-functional monomer.

39. The method according to claim 8, wherein the second polymerizable polymeric precursor comprises a thermal activated initiator and a monomer, wherein the monomer is 80% or less of the second polymerizable polymer precursor.

40. The method according to claim 8, wherein the polymerized second polymerizable polymeric precursor is a cross-linked polymer having a refractive index of at least 1.49.

41. The method according to claim 40, wherein the polymerized second polymerizable polymeric precursor is a cross-linked polymer having a refractive index of at least 1.59.

42. The method according to claim 40, wherein the polymerized second polymerizable polymeric precursor is a cross-linked polymer having a refractive index of at least 1.7.

43. The method according to claim 40, wherein the cross-linked polymer comprises one or more essentially transparent polymers.

44. The method according to claim 40, wherein the cross-linked polymer comprises mono or multi-functional monomers or co-monomers of one or more of the group consisting of:

polymethylmethacrylate, polystyrene, and polytribromostyrene.

45. An apparatus for fabricating a three dimensional polymeric structure, comprising:

a light source, wherein the light source provides a beam of light;

a mask, wherein when the beam of light passes through the mask a patterned beam of light is created;

a photocurable liquid, wherein the beam of light and the mask are positioned such that the patterned beam of light is incident on the photocurable liquid,

a platform, wherein the platform is moveable relative to a bottom surface of the mask, wherein at least a portion of the photocurable liquid is positioned between the platform and the bottom surface of the mask, wherein when the patterned beam of light is incident on the photocurable liquid a portion of the photocurable liquid corresponding to a beam pattern of the patterned beam of light is polymerized.

46-68. -68. (canceled)

69. A product, comprising:

a three dimensional polymeric structure having a plurality of component elements positioned in a two-dimensional array at a uniform interelement distance of less than 100 microns.

70-91. -91. (canceled)