GAS ISOLATION CHAMBER AND PLASMA DEPOSITION APPARATUS THEREOF
First Claim
1. A gas isolation chamber, comprising:
- a vacuum chamber, further comprising;
a first chamber part;
a second chamber part, arranged corresponding to the first chamber part while allowing a first opening and a second opening to be formed between the first chamber part and the second chamber part; and
at least one first gas valve unit, disposed on the first chamber part;
a first body module, disposed on the inner wall of the first chamber part, having a first gas hole arranged at a position corresponding to the at least one first gas valve unit while allowing the first gas hole to be connected to the at least one first gas valve unit;
a second body module, disposed on the inner wall of the second chamber part at a position corresponding to the first body part for allowing a slit channel to be formed between the second and the first body modules in a manner that the slit channel is connected respectively to the first opening, the second opening and the first gas hole; and
a first temperature modulator, disposed in the first body module.
1 Assignment
0 Petitions
Accused Products
Abstract
A gas isolation chamber comprises a vacuum chamber, a first body module, a second body module and a first temperature modulator. The vacuum chamber comprises a first chamber part, a second chamber part and at least one first gas valve unit. The first body module is disposed on the inner wall of the first chamber part and has a first gas hole corresponding to the position of the first gas valve unit. The first gas hole is connected to the first gas valve unit. The second body module is disposed on the inner wall of the second chamber part such that a slit channel can be formed between the second and the first body modules. The first temperature modulator is disposed in the first body module. The gas isolation chamber is further combined with the vacuum film process chambers to form a plasma deposition apparatus for proceeding continuous deposition process.
17 Citations
26 Claims
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1. A gas isolation chamber, comprising:
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a vacuum chamber, further comprising; a first chamber part; a second chamber part, arranged corresponding to the first chamber part while allowing a first opening and a second opening to be formed between the first chamber part and the second chamber part; and at least one first gas valve unit, disposed on the first chamber part; a first body module, disposed on the inner wall of the first chamber part, having a first gas hole arranged at a position corresponding to the at least one first gas valve unit while allowing the first gas hole to be connected to the at least one first gas valve unit; a second body module, disposed on the inner wall of the second chamber part at a position corresponding to the first body part for allowing a slit channel to be formed between the second and the first body modules in a manner that the slit channel is connected respectively to the first opening, the second opening and the first gas hole; and a first temperature modulator, disposed in the first body module. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A plasma deposition apparatus, comprising:
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a material feeding chamber; a first process chamber, connected to the material feeding chamber; a first gas isolation chamber, further comprising; a vacuum chamber, further comprising; a first chamber part; a second chamber part, arranged corresponding to the first chamber part while allowing a first opening and a second opening to be formed between the first chamber part and the second chamber part; and at least one first gas valve unit, disposed on the first chamber part; a first body module, disposed on the inner wall of the first chamber part, having a first gas hole arranged at a position corresponding to the at least one first gas valve unit while allowing the first gas hole to be connected to the at least one first gas valve unit a second body module, disposed on the inner wall of the second chamber part at a position corresponding to the first body part for allowing a slit channel to be formed between the second and the first body modules in a manner that the slit channel is connected respectively to the first opening, the second opening and the first gas hole; and a first temperature modulator, disposed in the first body module; a second process chamber, connected to the first gas isolation chamber; and a material collecting chamber, connected to the second process chamber; wherein, the first gas isolation chamber is arranged at a position between the first process chamber and the second process chamber while allowing the first opening to connect to the first process chamber and the second opening to connect to the second process chamber. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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Specification