GAS SHOWER DEVICE HAVING GAS CURTAIN AND APPARATUS FOR DEPOSITING FILM USING THE SAME

• US 20140123900A1
• Filed: 07/05/2013
• Published: 05/08/2014
• Est. Priority Date: 11/02/2012
• Status: Active Grant

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: WANG, Ching-Chiun, Huang, Chih-Yung, Chien, Jung-Chen, Tsai, Chen-Der, Chen, Chien-Chih, Lin, Kung-Liang
• Granted Patent: US 10,458,019 B2
• Time in Patent Office: Days
• US Class Current: 118/724
• CPC Class Codes: C23C 16/45519 Inert gas curtains
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45572 Cooled nozzles
• CPC Class Codes: C23C 16/45593 Recirculation of reactive gases

Abstract

A gas shower device having gas curtain comprises a first gas shower unit for injecting a reaction gas, thereby forming a reaction gas region, and a second gas shower unit. The second gas shower unit arranged around a periphery of the first gas shower unit comprises a buffer gas chamber for providing a buffer gas, and a curtain distribution plate. The curtain distribution plate further comprises a plurality through holes for injecting the buffer gas, thereby forming a gas curtain around a periphery of the reaction gas region. In another embodiment, an apparatus for depositing film is provided by utilizing the gas shower device having gas curtain, wherein the gas curtain prevents the reaction gas in the reaction gas region from being affected directly by a vacuum pressure so that a residence time of reaction gas can be extended thereby increasing the utilization of reaction gas and film-forming efficiency.

Claims

1. A gas shower device having gas curtain, comprising:

a first gas shower unit, for injecting a reaction gas, thereby forming a reaction gas region; and

a second gas shower unit, arranged around a periphery of the first gas shower unit, further comprising;

a buffer gas chamber, for providing a buffer gas, and

a gas curtain distribution plate, being connected to the buffer gas chamber circumferentially furnished at the periphery of the first shower unit, and having a plurality of through-holes provided for letting the buffer gas to pass therethrough to generate a gas curtain surrounding the periphery of the process gas region.

2. The gas shower device of claim 1, wherein the buffer gas is the same gas as the reaction gas.

3. The gas shower device of claim 1, wherein the buffer gas is an inert gas.

4. The gas shower device of claim 1, wherein the first shower unit further comprises:

a gas distribution plate, configured with a plurality of gas holes; and

a reaction gas supply chamber, connected to the gas distribution plate for providing the reaction gas to the gas distribution plate and then to be injected through the plural gas holes.

5. The gas shower device of claim 4, wherein the gas distribution plate is a circular plate, and the reaction gas supply chamber is a chamber with circular cross section.

6. The gas shower device of claim 4, wherein the gas distribution plate is integrally formed with the curtain distribution plate.

7. The gas shower device of claim 1, wherein each of the plural through holes is a vertical via hole.

8. The gas shower device of claim 1, wherein each of the through holes is an oblique via hole capable of enabling the gas curtain to be formed as a spiral gas curtain.

9. The gas shower device of claim 1, wherein the cross section of each through hole is formed like a circular or a slit.

10. The gas shower device of claim 1, further comprising:

a circulation cooling unit, disposed at a position between the first shower unit and the second shower unit and surrounding a periphery of the first shower unit while the second shower unit is arranged surrounding the first shower unit.

11. A film deposition apparatus, comprising:

a process chamber;

a first shower unit, arranged on top of the process chamber for injecting a reaction gas into the process chamber and thereby forming a reaction gas region;

a vacuum pump, connected to the process chamber for causing a vacuum negative pressure to build inside the process chamber; and

a second shower unit, arranged on top of the process chamber surrounding the first shower unit, further comprising;

a buffer gas chamber, for providing a buffer gas, and

a gas curtain distribution plate, being connected to the buffer gas chamber, circumferentially furnished at the periphery of the first shower unit, and having a plurality of through-holes provided for letting the buffer gas to pass therethrough to generate a gas curtain surrounding the periphery of the process gas region.

12. The film deposition apparatus of claim 11, wherein the buffer gas is the same gas as the reaction gas.

13. The film deposition apparatus of claim 11, wherein the buffer gas is an inert gas.

14. The film deposition apparatus of claim 11, wherein the first shower unit further comprises:

a gas distribution plate, configured with a plurality of gas holes; and

a reaction gas supply chamber, connected to the gas distribution plate for providing the reaction gas to the gas distribution plate and then to be injected through the plural gas holes.

15. The film deposition apparatus of claim 14, wherein the gas distribution plate is a circular plate, and the reaction gas supply chamber is a chamber with circular cross section.

16. The film deposition apparatus of claim 14, wherein the gas distribution plate is integrally formed with the curtain distribution plate.

17. The film deposition apparatus of claim 11, wherein each of the plural through holes is a vertical via hole.

18. The film deposition apparatus of claim 11, wherein each of the through holes is an oblique via hole capable of enabling the gas curtain to be formed as a spiral gas curtain.

19. The film deposition apparatus of claim 11, wherein the cross section of each through hole is formed like a circular or a slit.

20. The film deposition apparatus of claim 11, further comprising:

a circulation cooling unit, disposed at a position between the first shower unit and the second shower unit and surrounding a periphery of the first shower unit while the second shower unit is arranged surrounding the first shower unit.