DISPLAY DEVICE AND MANUFACTURING METHOD THEREOF
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Accused Products
Abstract
In a semi-transmission liquid crystal display device, two resist masks are required to form a reflective electrode and a transparent electrode; therefore, cost is high. A transparent electrode and a reflective electrode which function as a pixel electrode are stacked. A resist pattern which includes a region having a thick film thickness and a region having a thinner film thickness than the aforementioned region is formed over the reflective electrode by using a light exposure mask which includes a semi-transmission portion. The reflective electrode and the transparent electrode are formed by using the resist pattern. Therefore, the reflective electrode and the transparent electrode can be formed by using one resist mask.
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Citations
43 Claims
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1-22. -22. (canceled)
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23. A display device comprising:
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a transistor over a first substrate, the transistor comprising a channel formation region in a semiconductor film; a first insulating film over the semiconductor film; a gate wiring over the first insulating film; a first conductive film over the first substrate; a second insulating film over the gate wiring and the first conductive film; source and drain electrode layers over the second insulating film; a third insulating film over the source and drain electrode layers; a second conductive film over the third insulating film, the second conductive film being capable of transmitting light; a third conductive film over the second conductive film, the third conductive film being capable of reflecting light; a liquid crystal layer over the third conductive film; and a second substrate over the liquid crystal layer, wherein the second conductive film comprises a first region which is overlapped with the third conductive film and a second region which is not overlapped with the third conductive film, wherein the first region includes a third region which overlaps the first conductive film with the second insulating film and the third insulating film interposed therebetween, and wherein the gate wiring and the first conductive film are formed by patterning a same conductive film. - View Dependent Claims (24, 25, 26, 27, 28, 29)
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30. A display device comprising:
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a transistor over a first substrate, the transistor comprising a channel formation region in a semiconductor film; a first insulating film over the semiconductor film; a gate wiring over the first insulating film; a first conductive film over the first substrate; a second insulating film over the gate wiring and the first conductive film; source and drain electrode layers over the second insulating film; a third insulating film over the source and drain electrode layers; a second conductive film over the third insulating film, the second conductive film being capable of transmitting light; a third conductive film over the second conductive film, the third conductive film being capable of reflecting light; a liquid crystal layer over the third conductive film; and a second substrate over the liquid crystal layer, wherein the second conductive film comprises a first region which is overlapped with the third conductive film and a second region which is not overlapped with the third conductive film, wherein the first region includes a third region which overlaps the first conductive film with the second insulating film and the third insulating film interposed therebetween, wherein the first region includes a fourth region which overlaps the semiconductor film with the first insulating film, the gate wiring, the second insulating film, the source and drain electrode layers, and the third insulating film interposed therebetween, and wherein the gate wiring and the first conductive film are formed by patterning a same conductive film. - View Dependent Claims (31, 32, 33, 34, 35, 36)
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37. A display device comprising:
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a transistor over a first substrate, the transistor comprising a channel formation region in a semiconductor film; a first insulating film over the semiconductor film; a gate wiring over the first insulating film; a first conductive film over the first substrate; a second insulating film over the gate wiring and the first conductive film; source and drain electrode layers over the second insulating film; a third insulating film over the source and drain electrode layers; a second conductive film over the third insulating film, the second conductive film being capable of transmitting light; a third conductive film over the second conductive film, the third conductive film being capable of reflecting light; a liquid crystal layer over the third conductive film; and a second substrate over the liquid crystal layer, wherein the second conductive film comprises a first region which is overlapped with the third conductive film and a second region which is not overlapped with the third conductive film, wherein the first region includes a third region which overlaps the first conductive film with the second insulating film and the third insulating film interposed therebetween, wherein the second region comprises an opening, and wherein the gate wiring and the first conductive film are formed by patterning a same conductive film. - View Dependent Claims (38, 39, 40, 41, 42, 43)
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Specification