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NANOPOSITIONING SUBSTRATE PREPARATION APPARATUS AND PREPARATION METHOD USING DIP PEN NANOLITHOGRAPHY WITH A SINGLE TIP OR MULTIPLE TIPS USING ATOMIC FORCE MICROSCOPE (AFM)

  • US 20140134336A1
  • Filed: 05/21/2012
  • Published: 05/15/2014
  • Est. Priority Date: 06/13/2011
  • Status: Active Grant
First Claim
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1. A nanopositioning substrate preparation apparatus comprising:

  • a substrate;

    a pattern index disposed on the substrate;

    an AFM tip configured to form a pattern on the pattern index;

    a first ink reservoir disposed on the substrate and configured to coat the AFM tip with a first ink;

    a position determining portion disposed on the substrate and configured to interact with the AMF tip;

    a first cleaning portion disposed on the substrate and configured to remove the first ink from the AFM tip;

    a second ink reservoir disposed on the substrate and configured to coat rc load ink on the AFM tip with a second ink;

    a second cleaning portion disposed on the substrate and configured to remove the second ink from; and

    an electrode connecting portion configured to apply a voltage to the position determining portion, in order to determine a position of the AMF tip when the AMF tip interacts with the position determining portion,wherein the AMF tip is configured to interact with the position determining portion, prior to forming the pattern using the first and second inks.

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