METHOD OF DETERMINING MASK PATTERN AND EXPOSURE CONDITION, STORAGE MEDIUM, AND COMPUTER
First Claim
1. A determining method for determining by use of a computer an effective light source distribution formed by an illumination optical system and a pattern of a mask used in an exposure apparatus including the illumination optical system configured to illuminate the mask using light from a light source and a projection optical system configured to project an image of a plurality of pattern elements of the mask onto a substrate, the method including the steps of:
- setting an evaluation position for evaluating an image of the plurality of pattern elements of the mask on an image plane of the projection optical system, and an evaluation item for evaluation at the evaluation position;
setting a first parameter to define the shape of the plurality of pattern elements of the mask;
setting a second parameter to define the effective light source distribution; and
repeating a process of calculation of the image of the plurality of pattern elements of the mask and calculation of the value of the evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the pattern of the mask,wherein in the step of setting the first parameter, the parameters of pattern elements in the plurality of pattern elements of the mask are set as one parameter by use of a value of an index representing the proximity effect that an adjacent pattern element adjacent to an evaluation pattern element in the plurality of pattern elements of the mask have on the image of the evaluation pattern element at the evaluation position of the evaluation pattern element.
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Accused Products
Abstract
A determining method includes the steps of setting a first parameter to define the shape of the plurality of pattern elements of the mask, setting a second parameter to define the effective light source distribution; and repeating the process of calculation of the image of the mask pattern and calculation of a value of an evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the mask pattern, wherein parameters of pattern elements are set as one parameter by using a value of an index representing the proximity effect.
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Citations
11 Claims
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1. A determining method for determining by use of a computer an effective light source distribution formed by an illumination optical system and a pattern of a mask used in an exposure apparatus including the illumination optical system configured to illuminate the mask using light from a light source and a projection optical system configured to project an image of a plurality of pattern elements of the mask onto a substrate, the method including the steps of:
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setting an evaluation position for evaluating an image of the plurality of pattern elements of the mask on an image plane of the projection optical system, and an evaluation item for evaluation at the evaluation position; setting a first parameter to define the shape of the plurality of pattern elements of the mask; setting a second parameter to define the effective light source distribution; and repeating a process of calculation of the image of the plurality of pattern elements of the mask and calculation of the value of the evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the pattern of the mask, wherein in the step of setting the first parameter, the parameters of pattern elements in the plurality of pattern elements of the mask are set as one parameter by use of a value of an index representing the proximity effect that an adjacent pattern element adjacent to an evaluation pattern element in the plurality of pattern elements of the mask have on the image of the evaluation pattern element at the evaluation position of the evaluation pattern element. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A non-transitory storage medium on which is stored a computer program for making a computer execute a determining method for determining by use of a computer an effective light source distribution formed by an illumination optical system and a pattern of a mask used in an exposure apparatus including the illumination optical system configured to illuminate the mask using light from a light source and a projection optical system configured to project an image of a plurality of pattern elements of the mask onto a substrate, the method including the steps of:
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setting an evaluation position for evaluating an image of the plurality of pattern elements of the mask on an image plane of the projection optical system, and an evaluation item for evaluation at the evaluation position; setting a first parameter to define the shape of the plurality of pattern elements of the mask; setting a second parameter to define the effective light source distribution; and repeating a process of calculation of the image of the plurality of pattern elements of the mask and calculation of the value of the evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the pattern of the mask, wherein in the step of setting the first parameter, the parameters of pattern elements in the plurality of pattern elements of the mask are set as one parameter by use of a value of an index representing the proximity effect that an adjacent pattern element adjacent to an evaluation pattern element in the plurality of pattern elements of the mask have on the image of the evaluation pattern element at the evaluation position of the evaluation pattern element.
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11. A computer configured to execute a determining method for determining by use of a computer an effective light source distribution formed by an illumination optical system and a pattern of a mask used in an exposure apparatus including the illumination optical system configured to illuminate the mask using light from a light source and a projection optical system configured to project an image of a plurality of pattern elements of the mask onto a substrate, the method including the steps of:
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setting an evaluation position for evaluating an image of the plurality of pattern elements of the mask on an image plane of the projection optical system, and an evaluation item for evaluation at the evaluation position; setting a first parameter to define the shape of the plurality of pattern elements of the mask; setting a second parameter to define the effective light source distribution; and repeating a process of calculation of the image of the plurality of pattern elements of the mask and calculation of the value of the evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the pattern of the mask, wherein in the step of setting the first parameter, the parameters of pattern elements in the plurality of pattern elements of the mask are set as one parameter by use of a value of an index representing the proximity effect that an adjacent pattern element adjacent to an evaluation pattern element in the plurality of pattern elements of the mask have on the image of the evaluation pattern element at the evaluation position of the evaluation pattern element.
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Specification