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Level Sensor of Exposure Apparatus and Wafer-Leveling Methods Using the Same

  • US 20140152991A1
  • Filed: 05/24/2013
  • Published: 06/05/2014
  • Est. Priority Date: 07/24/2012
  • Status: Abandoned Application
First Claim
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1. A level sensor of an exposure apparatus, comprising:

  • a light source that generates light that is illuminated onto a top surface of a wafer;

    a projection part provided in a path of incident light propagating from the light source to the wafer, the projection part having a single first slit;

    a detection part provided in a path of reflected light that is reflected from the wafer, the detection part having a single second slit; and

    a detector that detects the reflected light that passes through the second slit of the detection part.

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