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LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE

  • US 20140154629A1
  • Filed: 11/26/2013
  • Published: 06/05/2014
  • Est. Priority Date: 11/30/2012
  • Status: Abandoned Application
First Claim
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1. A lithography apparatus that performs drawing on a substrate with an energy beam based on bitmap data generated via error diffusion from pattern data, the lithography apparatus comprising:

  • a smoothing device configured to perform smoothing on the pattern data before the error diffusion.

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