LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE

• US 20140154629A1
• Filed: 11/26/2013
• Published: 06/05/2014
• Est. Priority Date: 11/30/2012
• Status: Abandoned Application

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Kinebuchi, Hiromi
• Application Number:
  US14/091,225
• Publication Number:
  US 20140154629A1
• Time in Patent Office: Days
• US Class Current: 430/296
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: H01J 2237/31798 detecting pattern defects
• CPC Class Codes: H01J 37/3026 Patterning strategy
• CPC Class Codes: H01J 37/3174 Particle-beam lithography, e.g. electron beam lithography

Abstract

A lithography apparatus that performs drawing on a substrate with an energy beam based on bitmap data generated via an error diffusion from pattern data includes a smoothing device configured to perform smoothing on the pattern data before the error diffusion.

Claims

1. A lithography apparatus that performs drawing on a substrate with an energy beam based on bitmap data generated via error diffusion from pattern data, the lithography apparatus comprising:

a smoothing device configured to perform smoothing on the pattern data before the error diffusion.

2. The lithography apparatus according to claim 1, wherein the smoothing device is configured to obtain, based on a value of a target pixel and at least one of a value of a pixel adjacent to the target pixel in a vertical direction and a value of a pixel adjacent to the target pixel in a horizontal direction, a value of the target pixel after the smoothing.

3. The lithography apparatus according to claim 1, wherein the smoothing device is configured to obtain, based on a value of a pixel to which a quantization error of a target pixel is not diffused by the error diffusion out of pixels adjacent to a target pixel and a value of the target pixel, a value of the target pixel after the smoothing.

4. The lithography apparatus according to claim 3, wherein the smoothing device is configured to obtain, based on a value of one pixel to which a quantization error of a target pixel is not diffused by the error diffusion out of pixels adjacent to a target pixel and a value of the target pixel, a value of the target pixel after the smoothing.

5. The lithography apparatus according to claim 1, further comprising a compensation device configured to compensate for movement of pattern caused by the smoothing in the pattern data.

6. The lithography apparatus according to claim 5, wherein the compensation device is configured to perform a geometrical conversion on the pattern data.

7. The lithography apparatus according to claim 5, further comprising a stage configured to hold the substrate and to be movable,

wherein the compensation device is configured to set an offset amount for a target position in positioning of the stage, so as to compensate for the movement.

8. The lithography apparatus according to claim 1, wherein the lithography apparatus performs drawing on the substrate with a charged particle beam as the energy beam.

9. The lithography apparatus according to claim 8, further comprising a blanking device configured to operate based on the bitmap data.

10. The lithography apparatus according to claim 1, wherein the smoothing device is configured to obtain, based only on a value of a target pixel and at least one of a value of a pixel adjacent to the target pixel in a vertical direction and a value of a pixel adjacent to the target pixel in a horizontal direction, a value of the target pixel after the smoothing.

11. The lithography apparatus according to claim 1, wherein the smoothing device is configured to obtain, based only on a value of a pixel to which a quantization error of a target pixel is not diffused by the error diffusion out of pixels adjacent to the target pixel and a value of the target pixel, a value of the target pixel after the smoothing.

12. The lithography apparatus according to claim 3, wherein the smoothing device is configured to obtain, based only on a value of one pixel to which a quantization error of a target pixel is not diffused by the error diffusion out of pixels adjacent to the target pixel and a value of the target pixel, a value of the target pixel after the smoothing.

13. A method of manufacturing an article, the method comprising:

forming a pattern on a substrate using a lithography apparatus; and

developing the substrate, on which the pattern has been formed, to manufacturing the article,

wherein the lithography apparatus performs drawing on the substrate with an energy beam based on bitmap data generated via error diffusion from pattern data, the lithography apparatus including;

a smoothing device configured to perform smoothing on the pattern data before the error diffusion.