MASK CLEANER AND CLEANING METHOD

• US 20140158157A1
• Filed: 06/20/2013
• Published: 06/12/2014
• Est. Priority Date: 12/12/2012
• Status: Active Grant

• Current Assignee: Kioxia Corporation
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: KOBAYASHI, Yoshihito
• Granted Patent: US 9,348,218 B2
• Time in Patent Office: Days
• US Class Current: 134/6
• CPC Class Codes: G03F 1/82 Auxiliary processes, e.g. cleaning or inspecting

Abstract

According to one embodiment, a mask cleaner includes a cleaner support casing having a major surface with a recess formed therein, another major surface, and a gas supply hole and a gas exhaust hole extending through the cleaner support casing between the another major surface and the recess, a sticky layer support board attached to the cleaner support casing to block an opening of the recess of the cleaner support casing, and a sticky layer attached to a surface of the sticky layer support board remote from the cleaner support casing.

Claims

1. A mask cleaner comprising:

a cleaner support casing having a major surface with a recess formed therein, another major surface, and a gas supply hole and a gas exhaust hole extending through the cleaner support casing between the another major surface and the recess;

a flat sticky layer support board attached to the cleaner support casing to block an opening of the recess of the cleaner support casing; and

a sticky layer configured to be used for removal of particles on a surface of a mask, the sticky layer being attached to a surface of the sticky layer support board remote from the cleaner support casing.

2. The mask cleaner according to claim 1, further comprising a gas supply pipe provided with a gas supply valve and connected to the gas supply hole, and a gas exhaust pipe provided with a gas exhaust valve and connected to the gas exhaust hole.

3. The mask cleaner according to claim 1, wherein the recess has a flat bottom, and a clearance between the flat bottom of the recess and the sticky layer support board is set to 0.01 mm to 50 mm when no gas is supplied to the recess.

4. The mask cleaner according to claim 1, wherein the sticky layer is set to a thickness of 0.5 μ

m to 300 μ

m.

5. The mask cleaner according to claim 1, wherein the gas supply hole is formed in the recess at central positions, and the gas exhaust hole is formed in the recess at peripheral positions.

6. The mask cleaner according to claim 1, wherein the cleaner support casing, the sticky layer support board, the sticky layer, and a mask stage with the mask placed thereon are contained in a chamber capable of being exhausted under a vacuum pressure.

7. A mask cleaner comprising:

a chamber containing a mask stage with a mask placed thereon;

a cleaner support casing having a major surface with a recess formed therein, the cleaner support casing having a gas supply hole and a gas exhaust hole extending therethrough between another major surface and the recess;

a gas supply pipe provided with a gas supply valve and connected to the gas supply hole;

a gas exhaust pipe provided with a gas exhaust valve and connected to the gas exhaust hole;

a flat sticky layer support board attached to the cleaner support casing to block an opening of the recess of the cleaner support casing; and

a sticky layer configured to be used for removal of particles on a surface of a mask, the sticky layer being attached to a surface of the sticky layer support board remote from the cleaner support casing.

8. The mask cleaner according to claim 7, wherein the recess has a flat bottom, and a clearance between the flat bottom of the recess and the sticky layer support board is set to 0.01 mm to 50 mm when no gas is supplied to the recess.

9. The mask cleaner according to claim 7, wherein the sticky layer is set to a thickness of 0.5 μ

m to 300 μ

m.

10. The mask cleaner according to claim 7, wherein the gas supply hole is formed in the recess at central positions, and the gas exhaust hole is formed in the recess at peripheral positions.

11. The mask cleaner according to claim 7, further an exhaust pipe used to exhaust the chamber.

12. A cleaning method comprising:

preparing a mask cleaner, the mask cleaner including;

a cleaner support casing having a major surface with a recess formed therein, another major surface, and a gas supply hole and a gas exhaust hole extending through the cleaner support casing between the another major surface and the recess;

a flat sticky layer support board attached to the cleaner support casing to block an opening of the recess of the cleaner support casing; and

a sticky layer attached to a surface of the sticky layer support board remote from the cleaner support casing;

supplying a gas into the recess through the gas supply hole to project a central portion of the sticky layer of the mask cleaner;

bringing the projected portion of the sticky layer into a major surface of a mask;

exhausting the gas in the recess through the gas exhaust hole to return the sticky layer to a flat state and put the sticky layer into close contact with the major surface of the mask; and

supplying the gas into the recess through the gas supply hole to project the central portion of the sticky layer, and to separate the sticky layer from the major surface of the mask such that the mask is separated beginning with a peripheral portion thereof.

13. The cleaning method according to claim 12, wherein pressure in a clearance between the sticky layer and the mask is reduced before the sticky layer is put into contact with the major surface of the mask.

14. The cleaning method according to claim 12, wherein the bringing the projected portion of the sticky layer into the major surface of the mask includes pressing the sticky layer support board against the mask using a bottom of the recess of the cleaner support casing.

15. The cleaning method according to claim 12, wherein

the bringing the projected portion of the sticky layer into the major surface of the mask includes returning the sticky layer to a flat state by the exhausting the gas, and at the same time making the sticky layer and the mask relatively close to each other;

and

the separating the sticky layer from the major surface of the mask includes projecting a central portion of the sticky layer by the supplying the gas, and at the same time making the sticky layer and the mask relatively away from each other.