Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
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Abstract
A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
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Citations
30 Claims
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1-12. -12. (canceled)
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13. A particle-optical arrangement, comprising:
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at least one charged-particle source for generating a beam of charged particles; at least one multi-aperture plate having a plurality of apertures formed in the plate, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, each of the charged-particle beamlets having a focus in a focusing region of the multi-aperture plate; and an objective lens for imaging substantially the focusing region of the multi-aperture plate onto an object positionable in an object plane of the particle-optical arrangement. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A multi-electron-beamlet inspection system, comprising:
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a stage for mounting an object to be inspected; at least one electron source for generating at least one electron beam; at least one multi-aperture plate having a plurality of apertures formed in the plate, wherein an array of electron beamlets is formed from the at least one electron beam downstream of the multi-aperture plate, each of the electron beamlets having a focus in a focusing region of the multi-aperture plate; and an objective lens for imaging substantially the focusing region of the multi-aperture plate onto the object; and a detector arrangement for detecting secondary electrons from the object generated by the array of electron beamlets, to produce an array of signals corresponding to the secondary electrons generated by substantially a single electron beamlet in the array of electron beamlets. - View Dependent Claims (26)
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27. A charged-particle multi-beamlet lithography system for writing a pattern on a resist coated object, the system comprising:
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a stage for mounting the object; at least one charged-particle source for generating at least one charged-particle beam; at least one multi-aperture plate having a plurality of apertures formed in the plate, wherein an array of charged-particle beamlets is formed from the at least one charged-particle beam downstream of the multi-aperture plate, each of the charged-particle beamlets having a focus in a focusing region of the multi-aperture plate; and an objective lens for imaging the focusing region on the object to form an array of charged-particle beam spots thereon. - View Dependent Claims (28)
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29. A method of multi-electron-beamlet inspection of a substrate, the method comprising:
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generating at least one electron beam; forming an array of electron beamlets from the at least one electron beam; focusing each electron beamlet to form an array of electron beamlet foci in a focusing region; imaging the array of electron beamlet foci onto the substrate.
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30. A method of writing a pattern on a resist coated object, the method comprising:
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generating at least one electron beam; forming an array of electron beamlets from the at least one electron beam; focusing each electron beamlet to form an array of electron beamlet foci in a focusing region; imaging the array of electron beamlet foci onto the object.
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Specification