SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
First Claim
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1. A semiconductor device comprising:
- n first pad structures including first stack layers disposed in a stair configuration, with a step difference being formed between the first pad structures and n being a natural number greater than or equal to 1;
n second pad structures including second stack layers disposed in a stair configuration, with a step difference being formed between the second pad structures; and
a cell structure disposed between the first pad structures and the second pad structures,wherein, in the first pad structures, at least one uppermost step and at least one lowest step include, respectively, one first stack layer, while the other step includes 2n first stack layers, andin the second pad structures, at least one uppermost step and at least one lowest step include, respectively, one second stack layer, while the other step includes 2n second stack layers.
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Abstract
A semiconductor device having reduced contact region area achieved at least in part by forming pad portions of the word lines using an asymmetric stair shape separately formed in first and second pad structures. Contact region area is reduced when compared with manufacturing processes known in the art. This leads to an increase in device integrity and a less complex manufacturing process.
4 Citations
20 Claims
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1. A semiconductor device comprising:
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n first pad structures including first stack layers disposed in a stair configuration, with a step difference being formed between the first pad structures and n being a natural number greater than or equal to 1; n second pad structures including second stack layers disposed in a stair configuration, with a step difference being formed between the second pad structures; and a cell structure disposed between the first pad structures and the second pad structures, wherein, in the first pad structures, at least one uppermost step and at least one lowest step include, respectively, one first stack layer, while the other step includes 2n first stack layers, and in the second pad structures, at least one uppermost step and at least one lowest step include, respectively, one second stack layer, while the other step includes 2n second stack layers. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A memory system comprising:
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a memory controller; and a non-volatile memory device including a semiconductor device comprising; n first pad structures including first stack layers disposed in a stair configuration, with a step difference being formed between the first pad structures and n being a natural number greater than or equal to 1; n second pad structures including second stack layers disposed in a stair configuration, with a step difference being formed between the second pad structures; and a cell structure disposed between the first pad structures and the second pad structures, wherein, in the first pad structures, at least one uppermost step and at least one lowest step include, respectively, one first stack layer, while the other step includes 2n first stack layers, and in the second pad structures, at least one uppermost step and at least one lowest step include, respectively, one second stack layer, while the other step includes 2n second stack layers. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification