CHARGED PARTICLE BEAM WRITING APPARATUS
First Claim
1. A multi charged particle beam writing apparatus comprising:
- a stage configured to mount a target object thereon;
an emission unit configured to emit a charged particle beam;
an aperture member, in which a plurality of openings are formed, configured to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings;
a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite; and
three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of the plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.
1 Assignment
0 Petitions
Accused Products
Abstract
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings, a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite, and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of a plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object.
7 Citations
10 Claims
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1. A multi charged particle beam writing apparatus comprising:
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a stage configured to mount a target object thereon; an emission unit configured to emit a charged particle beam; an aperture member, in which a plurality of openings are formed, configured to form a multibeam by letting a region including a whole of the plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of the plurality of openings; a plurality of electromagnetic lenses, directions of whose magnetic fields are opposite; and three or more electrostatic lenses, at least one of which is arranged in each of the magnetic fields of the plurality of electromagnetic lenses and one or more of which also serve as deflectors for collectively deflecting the multibeam onto the target object. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification