NONPLANAR III-N TRANSISTORS WITH COMPOSITIONALLY GRADED SEMICONDUCTOR CHANNELS
First Claim
1. A non-planar III-N transistor disposed on a substrate, the transistor comprising:
- two wide band gap material layers on opposite {0001} surfaces of a III-N semiconductor channel that has a compositional grading along the c-axis between the two wide band gap III-N layers;
a gate stack comprising a gate dielectric and gate electrode, the gate stack disposed over opposing surfaces of the semiconductor channel that span a distance between the two wide band gap material layers; and
a pair of source/drain regions embedded in or coupled to the non-planar III-N semiconductor body at opposite sides of the gate stack.
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Abstract
A III-N semiconductor channel is compositionally graded between a transition layer and a III-N polarization layer. In embodiments, a gate stack is deposited over sidewalls of a fin including the graded III-N semiconductor channel allowing for formation of a transport channel in the III-N semiconductor channel adjacent to at least both sidewall surfaces in response to a gate bias voltage. In embodiments, a gate stack is deposited completely around a nanowire including a III-N semiconductor channel compositionally graded to enable formation of a transport channel in the III-N semiconductor channel adjacent to both the polarization layer and the transition layer in response to a gate bias voltage.
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Citations
20 Claims
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1. A non-planar III-N transistor disposed on a substrate, the transistor comprising:
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two wide band gap material layers on opposite {0001} surfaces of a III-N semiconductor channel that has a compositional grading along the c-axis between the two wide band gap III-N layers; a gate stack comprising a gate dielectric and gate electrode, the gate stack disposed over opposing surfaces of the semiconductor channel that span a distance between the two wide band gap material layers; and a pair of source/drain regions embedded in or coupled to the non-planar III-N semiconductor body at opposite sides of the gate stack. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 16, 17, 18, 19)
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13. A non-planar III-N transistor disposed on a substrate, the transistor comprising:
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two wide band gap material layers on opposite sides of a III-N semiconductor channel that has a compositional grading along the c-axis between the two wide band gap crystalline material layers; a gate stack comprising a gate dielectric and gate electrode, the gate stack disposed over opposing surfaces of the semiconductor channel that span a distance between the two wide band gap material layers; and a pair of source/drain regions embedded in or coupled to the non-planar III-N semiconductor body at opposite sides of the gate stack. wherein a transport channel is formed in the III-N semiconductor channel adjacent to both opposing surfaces in response to a bias voltage on a gate electrode exceeding a threshold voltage of the transistor. - View Dependent Claims (14, 15)
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20-25. -25. (canceled)
Specification