×

SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME

  • US 20140177331A1
  • Filed: 12/04/2013
  • Published: 06/26/2014
  • Est. Priority Date: 12/24/2012
  • Status: Active Grant
First Claim
Patent Images

1. A semiconductor device comprising:

  • a semiconductor substrate including a peripheral region;

    an active region, a first device isolation region, and a second device isolation region formed in the semiconductor substrate of the peripheral region, the active region comprising a fin-type active region that corresponds to top and sidewall surfaces of the active region;

    an insulation film formed in the first and second device isolation regions; and

    a gate formed over the fin-type active region.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×