METHOD FOR PREPARING ABSORBING LAYER OF SOLAR CELL AND THERMAL TREATMENT DEVICE THEREOF

• US 20140179048A1
• Filed: 06/03/2013
• Published: 06/26/2014
• Est. Priority Date: 12/21/2012
• Status: Abandoned Application

• Current Assignee: Industrial Technology Research Institute
• Original Assignee: Industrial Technology Research Institute
• Inventors: Wang, Yu-Yun, Wu, Tzung-Shin, Wu, Shih-Hsiung, Hsu, Hung-Ru, Chen, Ho-Min
• Application Number:
  US13/908,256
• Publication Number:
  US 20140179048A1
• Time in Patent Office: Days
• US Class Current: 438/57
• CPC Class Codes: H01L 31/0326 comprising AIBIICIVDVI kesterite compounds, e.g. Cu2ZnSnSe4, Cu2ZnSnS4
• CPC Class Codes: H01L 31/1864 Annealing
• CPC Class Codes: Y02E 10/50 Photovoltaic [PV] energy
• CPC Class Codes: Y02P 70/50 Manufacturing or production processes characterised by the final manufactured product

Abstract

A method for preparing an absorbing layer of a solar cell includes the following steps. An absorbing layer precursor containing at least one group XIV element is loaded on a substrate. A solid vapor source containing a group XIV element, the same as the group XIV element in the absorbing layer precursor is provided. The solid vapor source corresponds to the absorbing layer precursor. The solid vapor source and the absorbing layer precursor are kept apart by a distance. A heating process is performed so that the absorbing layer precursor forms an absorbing layer, the solid vapor source is vaporized and generates a gas containing the group XIV element, and the gas containing the group XIV element inhibits the effusion of the group XIV element of the absorbing layer precursor so that the proportion of the group XIV element in the formed absorbing layer is consistent.

Claims

1. A method for preparing an absorbing layer of a solar cell, comprising:

providing a substrate, an absorbing layer precursor being loaded on the substrate, and the absorbing layer precursor comprising at least one group XIV element;

providing a solid vapor source, the solid vapor source containing a group XIV element the same as the group XIV element in the absorbing layer precursor, the solid vapor source corresponding to the absorbing layer precursor, and the solid vapor source and the absorbing layer precursor being kept apart by a distance; and

performing a heating process, so that the absorbing layer precursor forming an absorbing layer on the substrate, the solid vapor source being vaporized and generating a gas of the group XIV element, and the gas of the group XIV element inhibiting the effusion of the group XIV element of the absorbing layer precursor so that the proportion of the group XIV element in the formed absorbing layer being consistent.

2. The method for preparing the absorbing layer of the solar cell according to claim 1, wherein the step of providing the solid vapor source further comprises:

providing a base; and

loading a film on the base, the film containing the group XIV element.

3. The method for preparing the absorbing layer of the solar cell according to claim 2, wherein the method for loading the thin film on the base comprises coating, chemical plating, sputtering, or evaporation.

4. The method for preparing the absorbing layer of the solar cell according to claim 1, wherein the reaction temperature of the heating process is 200°

C. to 800°

C.

5. The method for preparing the absorbing layer of the solar cell according to claim 1, wherein the reaction temperature of the heating process is 350°

C. to 650°

C.

6. The method for preparing the absorbing layer of the solar cell according to claim 1, wherein the solid vapor source is stannic sulfide, stannic selenide, stannous sulfide, stannous selenide, or the combination thereof.

7. The method for preparing the absorbing layer of the solar cell according to claim 1, further comprising a gas of a group XVI element, the gas of the group XVI element being sulfur vapor, selenium vapor, hydrogen sulfide, hydrogen selenide, or the combination thereof.

8. The method for preparing the absorbing layer of the solar cell according to claim 1, further comprising a gas consisting a group XIV element and a group XVI element, the gas consisting the group XIV element and the group XVI element being stannic sulfide, stannic selenide, stannous sulfide, stannous selenide, or the combination thereof.

9. A thermal treatment device, used for performing thermal treatment on an absorbing layer precursor of a solar cell, the absorbing layer precursor containing at least one group XIV element, the thermal treatment device comprising:

a cavity;

a substrate, disposed in the cavity, and used for bearing the absorbing layer precursor;

a base, disposed in the cavity, and facing the substrate and the absorbing layer precursor; and

a solid vapor source, disposed on the substrate, and containing a group XIV element the same as the group XIV element in the absorbing layer precursor, the solid vapor source facing the absorbing layer precursor;

wherein, the solid vapor source and the base are kept apart by a distance, so that the solid vapor source inhibits the effusion of the group XIV element of the absorbing layer precursor so that the proportion of the group XIV element in an absorbing layer formed by the absorbing layer precursor is consistent.

10. The thermal treatment device according to claim 9, wherein the distance between the solid vapor source and the absorbing layer precursor is 0.1 cm to 4 cm.

11. The thermal treatment device according to claim 9, wherein the distance between the solid vapor source and the absorbing layer precursor is 0.1 cm to 2 cm.

12. The thermal treatment device according to claim 9, wherein the group XIV element is tin.

13. The thermal treatment device according to claim 9, wherein the solid vapor source is stannic sulfide, stannous sulfide, stannic selenide, stannous selenide, or the combination thereof.

14. The thermal treatment device according to claim 9, wherein the cavity is an open cavity.

15. The thermal treatment device according to claim 9, wherein the cavity is a half-open cavity.

16. The thermal treatment device according to claim 9, further comprising a gas of a group XVI element, the gas of the group XVI element being sulfur vapor, selenium vapor, hydrogen sulfide, hydrogen selenide, or the combination thereof.

17. The thermal treatment device according to claim 9, further comprising a gas consisting a group XIV element and a group XVI element, the gas consisting the group XIV element and the group XVI element being stannic sulfide, stannous sulfide, stannic selenide, stannous selenide, or the combination thereof.