DEPOSITION APPARATUS
First Claim
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1. A deposition apparatus comprising:
- a substrate support;
a substrate supporting pin inserted into a hole formed in the substrate support;
a supporting plate supporting the substrate supporting pin; and
a supporting pin cover arranged on top of the substrate supporting pin within the hole of the substrate support.
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Abstract
A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.
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Citations
18 Claims
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1. A deposition apparatus comprising:
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a substrate support; a substrate supporting pin inserted into a hole formed in the substrate support; a supporting plate supporting the substrate supporting pin; and a supporting pin cover arranged on top of the substrate supporting pin within the hole of the substrate support. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification