DEPOSITION APPARATUS
First Claim
Patent Images
1. A deposition apparatus comprising:
- a substrate support;
a substrate supporting pin inserted into a hole formed in the substrate support;
a supporting plate supporting the substrate supporting pin; and
a supporting pin cover arranged on top of the substrate supporting pin within the hole of the substrate support.
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Abstract
A deposition apparatus is provided to eliminate unnecessary empty spaces that may form between a substrate and a substrate supporting pin, which may be formed within a substrate supporting pin hole, by covering the substrate supporting pin, inserted into the substrate supporting pin hole formed in the substrate support, by a substrate supporting pin cover loaded on the substrate support. Accordingly, the temperature under the substrate can be maintained constant, and generation of parasitic plasma or contaminating particles can be avoided.
274 Citations
18 Claims
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1. A deposition apparatus comprising:
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a substrate support; a substrate supporting pin inserted into a hole formed in the substrate support; a supporting plate supporting the substrate supporting pin; and a supporting pin cover arranged on top of the substrate supporting pin within the hole of the substrate support. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification