Please download the dossier by clicking on the dossier button x
×

SHOWER HEAD UNIT AND CHEMICAL VAPOR DEPOSITION APPARATUS

  • US 20140202388A1
  • Filed: 03/20/2014
  • Published: 07/24/2014
  • Est. Priority Date: 09/30/2008
  • Status: Active Grant
First Claim
Patent Images

1. A chemical vapor deposition apparatus comprising:

  • a chamber;

    a chamber lead having a gas in port configured to receive a reaction gas, the chamber lead connected to a top surface of the chamber to seal up the chamber;

    a shower head connected to the chamber lead, the shower head having a plurality of spray holes separated from each other for spraying the reaction gas onto the surface of a wafer in the chamber; and

    a protrusion surrounding the spray holes on the bottom surface of the shower head so that an induction groove is provided inside the protrusionwherein the plurality of spray holes have a plurality of main holes and a plurality of supplementary holes, each of the main holes is uniformly arranged in each corner of a square-grid pattern across the shower head and each of the supplementary holes is disposed at each centerpoint of the square-grid pattern,wherein each of the supplementary holes has a supplementary exit hole having a taper angle and each of the main holes has a main exit hole having a taper angle that is wider than the taper angle of the supplementary hole so that the reaction gas sprayed through the main holes collides with the reaction gas sprayed through the supplementary holes in the induction groove, the supplementary exit hole being positioned on the lowermost of the supplementary hole and the main exit hole being positioned on the lowermost of the main hole.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×