RAW MATERIAL GAS SUPPLY DEVICE, FILM FORMING APPARATUS, RAW MATERIAL GAS SUPPLY METHOD, AND NON-TRANSITORY STORAGE MEDIUM
First Claim
1. A raw material gas supply device for use in a film forming apparatus which forms a film on a substrate, comprising:
- a raw material container configured to accommodate a liquid or solid raw material;
a carrier gas supply unit configured to supply a carrier gas to a gas phase zone defined inside the raw material container;
a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the raw material container to the film forming apparatus;
a flow rate measurement unit configured to measure a flow rate of the vaporized raw material flowing through the raw material gas supply path;
a pressure control unit configured to control an internal pressure of the raw material container; and
a control unit configured to compare the measured flow rate of the vaporized raw material with a predetermined target value, and to control the pressure control unit to increase the internal pressure of the raw material container when the measured flow rate of the vaporized raw material is higher than the predetermined target value, and to decrease the internal pressure of the raw material container when the measured flow rate of the vaporized raw material is lower than the predetermined target value.
1 Assignment
0 Petitions
Accused Products
Abstract
Provided is a raw material gas supply device for use in a film forming apparatus, which includes: a raw material container configured to accommodate a solid raw material; a carrier gas supply unit configured to supply a carrier gas to the container; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the container to the film forming apparatus; a flow rate measurement unit configured to measure a flow rate of the vaporized raw material; a pressure control unit configured to control an internal pressure of the container; and a control unit configured to control the pressure control unit to increase the internal pressure of the container when the measured flow rate of the vaporized raw material is higher than a predetermined target value, and to decrease the internal pressure when the measured flow rate is lower than the target value.
70 Citations
13 Claims
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1. A raw material gas supply device for use in a film forming apparatus which forms a film on a substrate, comprising:
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a raw material container configured to accommodate a liquid or solid raw material; a carrier gas supply unit configured to supply a carrier gas to a gas phase zone defined inside the raw material container; a raw material gas supply path configured to supply a raw material gas containing a vaporized raw material from the raw material container to the film forming apparatus; a flow rate measurement unit configured to measure a flow rate of the vaporized raw material flowing through the raw material gas supply path; a pressure control unit configured to control an internal pressure of the raw material container; and a control unit configured to compare the measured flow rate of the vaporized raw material with a predetermined target value, and to control the pressure control unit to increase the internal pressure of the raw material container when the measured flow rate of the vaporized raw material is higher than the predetermined target value, and to decrease the internal pressure of the raw material container when the measured flow rate of the vaporized raw material is lower than the predetermined target value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A raw material gas supply method for use in a film forming apparatus which forms a film on a substrate, the method comprising:
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supplying a carrier gas to a gas phase zone defined inside a raw material container, the raw material container accommodating a liquid or solid raw material; vaporizing the raw material; supplying a raw material gas containing the vaporized raw material from the raw material container to the film forming apparatus via a raw material gas supply path; measuring a flow rate of the vaporized raw material flowing through the raw material gas supply path; comparing the measured flow rate of the vaporized raw material obtained by the flow rate measurement unit with a predetermined target value; and controlling an internal pressure of the raw material container to be increased when the measured flow rate of the vaporized raw material is higher than the predetermined target value, and to be decreased when the measured flow rate of the vaporized raw material is lower than the predetermined target value. - View Dependent Claims (10, 11, 12, 13)
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Specification