AUTOMATED DESIGN LAYOUT PATTERN CORRECTION BASED ON CONTEXT-AWARE PATTERNS
First Claim
Patent Images
1. A method comprising:
- scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern;
determining a context of the difficult-to-manufacture pattern within the drawn semiconductor design layout based on determining neighboring features of the difficult-to-manufacture pattern;
determining, by a processor, a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern and based on the context by accounting for the neighboring features; and
replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout.
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Abstract
A process and apparatus are provided for automated pattern-based semiconductor design layout correction. Embodiments include scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern, determining a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern, and replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout.
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Citations
20 Claims
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1. A method comprising:
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scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern; determining a context of the difficult-to-manufacture pattern within the drawn semiconductor design layout based on determining neighboring features of the difficult-to-manufacture pattern; determining, by a processor, a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern and based on the context by accounting for the neighboring features; and replacing the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout. - View Dependent Claims (4, 5, 6, 7, 8, 9)
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2. (canceled)
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3. (canceled)
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10. An apparatus comprising:
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at least one processor; and at least one memory including computer program code for one or more programs, the at least one memory and the computer program code configured to, with the at least one processor, cause the apparatus to perform at least the following; scan a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout based on a match with a pre-characterized difficult-to-manufacture pattern; determine a context of the difficult-to-manufacture pattern within the drawn semiconductor design layout based on determining neighboring features of the difficult-to-manufacture pattern; determine a corrected pattern based on a pre-determined correlation between the corrected pattern and the pre-characterized difficult-to-manufacture pattern and based on the context by accounting for the neighboring features; and replace the difficult-to-manufacture pattern with the corrected pattern within the drawn semiconductor design layout. - View Dependent Claims (13, 14, 15, 16, 17, 18)
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11. (canceled)
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12. (canceled)
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19. A method comprising:
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scanning a drawn semiconductor design layout to determine a difficult-to-manufacture pattern within the drawn semiconductor design layout; determining, by a processor, a match between the difficult-to-manufacture pattern and a pre-characterized difficult-to-manufacture pattern; determining a context of the difficult-to-manufacture pattern within the drawn semiconductor design layout based on determining neighboring features of the difficult-to-manufacture pattern; determining an extraction radius associated with the difficult-to-manufacture pattern based on the context by accounting for the neighboring features; deleting a portion of the drawn semiconductor design layout based on the extraction radius and the difficult-to-manufacture pattern; and replacing the deleted portion with a corrected portion based on the pre-characterized difficult-to-manufacture pattern. - View Dependent Claims (20)
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Specification