POROUS POLYMER STRUCTURES AND METHODS AND ARTICLES RELATING THERETO

• US 20140228463A1
• Filed: 01/31/2014
• Published: 08/14/2014
• Est. Priority Date: 02/04/2013
• Status: Active Grant

• Current Assignee: University of Southern California
• Original Assignee: University of Southern California
• Inventors: Gupta, Malancha, Seidel, Scott J., Kwong, Philip J.
• Granted Patent: US 9,376,516 B2
• Time in Patent Office: Days
• US Class Current: 521/149
• CPC Class Codes: C08F 120/16 of phenols or of alcohols containing two or more carbon atoms
• CPC Class Codes: C08F 2/00 Processes of polymerisation
• CPC Class Codes: C08F 220/06 Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
• CPC Class Codes: C08F 220/54 Amides , e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
• CPC Class Codes: C08F 220/56 Acrylamide; Methacrylamide
• CPC Class Codes: C08F 222/102 of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Abstract

A porous polymer structure may be formed by cooling a substrate to a temperature at or below a freezing point of a monomer, wherein the monomer is capable of free-radical polymerization; exposing the substrate to an initiator and the monomer, each in a vapor phase, wherein a concentration of the monomer in the vapor phase is above a saturation pressure of the monomer; converting the initiator to a free radical; crystalizing and depositing the monomer on the substrate; and polymerizing at least some of the monomer on the substrate, thereby forming a porous polymer structure on the substrate.

Claims

1. A method comprising:

cooling a substrate to a temperature at or below a freezing point of a monomer, wherein the monomer is capable of free-radical polymerization;

exposing the substrate to an initiator and the monomer, each in a vapor phase, wherein a concentration of the monomer in the vapor phase is above a saturation pressure of the monomer;

converting the initiator to a free radical;

crystalizing and depositing the monomer on the substrate; and

polymerizing at least some of the monomer on the substrate, thereby forming a porous polymer structure on the substrate.

2. The method of claim 1, wherein the porous polymer structure comprises microstructures that comprise a polymer, wherein the polymer is a polymerization product of reactants that comprise the free radical and the monomer.

3. The method of claim 2, wherein the porous polymer structure has two types of pores:

(1) intracrystalline pores within microstructures and (2) intercrystalline pores between the microstructures.

4. The method of claim 3, wherein a pore size of at least some of the intracrystalline pores is about 10 nm to about 10 microns.

5. The method of claim 3, wherein a pore size of at least some of the intercrystalline pores is about 1 micron to about 500 microns.

6. The method of claim 1 further comprising:

removing the porous polymer structure from the substrate.

7. The method of claim 1 further comprising:

after forming the porous polymer structure, removing the monomer having not polymerized from the surface and the porous polymer structure.

8. The method of claim 1, wherein the monomer is a first monomer;

wherein the method further comprises exposing the substrate to a second monomer capable of free-radical polymerization in the vapor phase;

wherein the first monomer and the second monomer are different; and

wherein the porous polymer structure comprises a polymer that is a polymerization product of reactants that comprise the free radical, the first monomer, and the second monomer.

9. The method of claim 1 further comprising:

applying a mask to the substrate before exposing the substrate to the initiator and the monomer.

10. The method of claim 1 further comprising:

depositing a layer on at least a portion of the porous polymer structure.

11. The method of claim 10, wherein the layer is a conformal layer.

12. The method of claim 10, wherein the layer is a dense layer.

13. The method of claim 1, wherein the substrate comprises at least one selected from the group consisting of:

a natural material, a metals, a ceramics, a polymer, and any hybrid thereof.

14. The method of claim 1, wherein the substrate has a 3-dimensional shape.

15. The method of claim 1, wherein the substrate is moving during (1) crystalizing and depositing the monomer as on the substrate and (2) polymerizing at least some of the monomer on the substrate.

16. The method of claim 1, wherein the monomer comprises at least one selected from the group consisting of:

N-isopropylacrylamide, methacrylic acid, 2-hydroxyethyl methacrylate, ethylene glycol dimethacrylate, glycidyl methacrylate, methyl methacrylate, styrene, 1H,1H,2H,2H-perfluorodecyl acrylate, 4-vinylpyridine, o-nitrobenzyl methacrylate, pentafluorophenyl methacrylate, and any combination thereof.

17. The method of claim 1, wherein the initiator comprises at least one selected from the group consisting of:

t-butyl peroxide, azobisisobutyronitrile, perfluorooctane sulfonyl fluoride, t-amyl peroxide, triethylamine, and any combination thereof.

18. The method of claim 1 further comprising:

exposing the substrate to a crosslinker.

19. A method comprising:

cooling a substrate to a temperature at or below a freezing point of a first monomer, wherein the first monomer is capable of free-radical polymerization;

exposing the substrate to a first initiator and the first monomer, each in a vapor phase, wherein a concentration of the first monomer in the vapor phase is above a saturation pressure of the first monomer;

converting the first initiator to a first free radical;

crystalizing and depositing the first monomer on the substrate;

polymerizing at least some of the first monomer on the substrate, thereby forming a porous polymer structure on the substrate;

cooling the porous polymer structure to a temperature at or below a freezing point of a second monomer, wherein the second monomer is capable of free-radical polymerization;

exposing the porous polymer structure to a second initiator and the second monomer, each in the vapor phase, wherein a concentration of the second monomer in the vapor phase is above a saturation pressure of the second monomer;

depositing the second monomer as on the porous polymer structure;

polymerizing at least some of the second monomer on the porous polymer structure, thereby producing the porous polymer structure with a first layer comprising a polymer of the first monomer and a second layer comprising a polymer of the second monomer.

20. An article comprising:

a porous polymer structure that comprises microstructures that comprise a polymer, wherein the polymer is a polymerization product of reactants that comprise a free radical and a monomer; and

wherein the porous polymer structure has two types of pores;

(1) intracrystalline pores within the microstructures; and

(2) intercrystalline pores between the microstructures, wherein a pore size of at least some of the intracrystalline pores is about 10 nm to about 10 microns, and wherein a pore size of at least some of the intercrystalline pores is about 1 micron to about 500 microns.