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IMAGING DEVICE AND METHOD FOR MANUFACTURING IMAGING DEVICE

  • US 20140231782A1
  • Filed: 04/28/2014
  • Published: 08/21/2014
  • Est. Priority Date: 10/31/2011
  • Status: Active Grant
First Claim
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1. An imaging device comprising:

  • a substrate;

    lower electrodes formed on the substrate;

    an organic layer formed on the lower electrodes and adapted to generate electric charges in response to irradiation with light;

    an upper electrode formed on the organic layer and adapted to transmit the light;

    a protective film formed on the upper electrode; and

    a patterned organic film formed on the protective film,wherein the protective film comprises at least one layer and has a total thickness of 30 to 500 nm,wherein the protective film of a single layer type has an internal stress of −

    50 MPa to +60 MPa in a whole of the protective film,wherein in the protective film of a two-layer type including a lower protective film and an upper protective film, the lower protective film has a thickness of 50 nm or less, and when the lower protective film is thinner than the upper protective film, the internal stress in the whole of the protective film satisfies an expression;



    4.6x−

    50≦

    y≦



    1.67x+60 when x is in a range of 0<

    x<

    15 and satisfies an expression;



    1.25x−

    100≦

    y<

    0 when x is in a range of 15≦

    x≦

    50, where the thickness of the lower protective film is denoted by x (nm) and the internal stress in the whole of the protective film is denoted by y (MPa), andwherein, when the lower protective film is thicker than the upper protective film, the internal stress in the whole of the protective film is in a range of 0<

    y≦

    +115 when x is in a range of 15<

    x≦

    50.

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