SEMICONDUCTOR DEVICE, RETICLE METHOD FOR CHECKING POSITION MISALIGNMENT AND METHOD FOR MANUFACTURING POSITION MISALIGNMENT CHECKING MARK
First Claim
Patent Images
1. A semiconductor device comprising:
- a circuit area in which an integrated circuit is formed;
a position misalignment checking mark of which a contrasting density is detected under polarized illumination and is not detectable under non-polarized illumination; and
a peripheral pattern that is disposed on a periphery of the position misalignment checking mark and has a contrasting density that is not detectable under the polarized illumination.
1 Assignment
0 Petitions
Accused Products
Abstract
According to one embodiment, there is provided a semiconductor device including a circuit area in which an integrated circuit is formed, a position misalignment checking mark of which a contrasting density is detected under polarized illumination and is not detectable under non-polarized illumination, and a peripheral pattern that is disposed on a periphery of the position misalignment checking mark and has a contrasting density that is not detectable under the polarized illumination.
26 Citations
20 Claims
-
1. A semiconductor device comprising:
-
a circuit area in which an integrated circuit is formed; a position misalignment checking mark of which a contrasting density is detected under polarized illumination and is not detectable under non-polarized illumination; and a peripheral pattern that is disposed on a periphery of the position misalignment checking mark and has a contrasting density that is not detectable under the polarized illumination. - View Dependent Claims (2, 3, 4, 5)
-
-
6. A reticle comprising:
-
a circuit area in which a circuit pattern is formed; a position misalignment checking mark of which a contrasting density is detected under polarized illumination and is not detectable under non-polarized illumination; and a peripheral pattern that is disposed on a periphery of the position misalignment checking mark and has a contrasting density that is not detectable under the polarized illumination. - View Dependent Claims (7, 8, 9, 10)
-
-
11. A method for checking a position misalignment, the method comprising:
-
forming a position misalignment checking mark of which a contrasting density is detected under polarized illumination and is not detectable under non-polarized illumination and a peripheral pattern that is disposed on a periphery of the position misalignment checking mark and has a contrasting density that is not detectable under the polarized illumination in a target layer; and observing the position misalignment checking mark under the polarized illumination. - View Dependent Claims (12, 13, 14, 15)
-
-
16. A method for manufacturing a position misalignment checking mark, the method comprising:
-
forming a position misalignment checking mark of which a contrasting density is detected under polarized illumination and is not detectable under non-polarized illumination and a peripheral pattern that is disposed on a periphery of the position misalignment checking mark and has a contrasting density that is not detectable under the polarized illumination in a target layer; forming a thin film in the position misalignment checking mark and the peripheral pattern; and flattening the thin film by CMP. - View Dependent Claims (17, 18, 19, 20)
-
Specification