ADAPTIVE DATA COLLECTION FOR LOCAL STATES OF A MATERIAL

• US 20140260623A1
• Filed: 03/13/2014
• Published: 09/18/2014
• Est. Priority Date: 03/13/2013
• Status: Active Grant

• Current Assignee: MRL Materials Resources LLC
• Original Assignee: MRL Materials Resources LLC
• Inventors: Salem, Ayman A., Satko, Daniel P., Shaffer, Joshua B.
• Granted Patent: US 9,557,299 B2
• Time in Patent Office: Days
• US Class Current: 73/584
• CPC Class Codes: G01N 23/20 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
• CPC Class Codes: G01N 23/22 by measuring secondary emission from the material
• CPC Class Codes: G01N 29/04 Analysing solids using acoustic emission techniques G01N29/14
• CPC Class Codes: G01N 29/4472 Mathematical theories or simulation

Abstract

According to aspects of the present disclosure, features of interest in materials are analyzed. The method comprises capturing a morphology of the feature of interest on a surface or an interior of a material under evaluation. The method also comprises selecting targeted spatial locations on the surface or the interior of the material under evaluation based upon the captured morphology. Also, the method comprises capturing information about the local state (e.g., crystallographic orientation) of the surface or the interior of the sample at the selected targeted spatial locations. Still further, the method comprises using the captured local state information to fill in the non-targeted spatial locations in the material corresponding to the captured morphology and or topology.

Claims

15-1. The method of claim 1, wherein capturing information giving the local state of the material under evaluation comprises capturing crystallographic orientation information of the surface of the sample by gathering crystallographic orientations by Rayleigh wave technique.