PLASMA PROCESSING APPARATUS
1 Assignment
0 Petitions
Accused Products
Abstract
This microwave plasma processing apparatus has, as a gas introduction mechanism for introducing a working gas inside a chamber (10), electrical discharge prevention members (96(1) to 96(8)), each of which is provided to a plurality of dielectric window gas passages (94(1) to (94(8)) through which a dielectric window (54) passes. Each electrical discharge prevention member (96(n)), a portion (114) of which protrudes only a height h, which is greater than or equal to a predetermined distance H, upward from the rear surface of a dielectric window (52) on the inlet side, passes through an opening (54a) of a slot plate (54), and inserts into a branched gas supply path (92(n)) of a gas branch part (90). The gas branch part (90), spring coils (116) and the slot plate (54), which surround the protruding portion (114) of each electrical discharge prevention member (96(n)), constitute an enclosing conductor (118).
267 Citations
86 Claims
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1. (canceled)
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2. A plasma processing apparatus comprising:
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a processing container configured to be evacuated to a vacuum and provided with a dielectric window; a substrate holding unit configured to hold a substrate to be processed within the processing container; a dielectric window gas flow path that penetrates the dielectric window; a processing gas supply unit including an external gas supply path which is connected with the dielectric window gas flow path on a rear side or outside of the dielectric window when viewed from a plasma generation space within the processing container, the processing gas supply unit being configured to supply at least a part of a required processing gas into the processing container through the external gas supply path and the dielectric window gas flow path; an electromagnetic wave supply unit configured to supply electromagnetic waves into the processing container through the dielectric window; an electric discharge prevention member integrally formed in or bonded to the dielectric window, the electric discharge prevention member having an inlet connected to an outlet of the external gas supply path and forming a portion or whole of the dielectric window gas flow path; and a surrounding conductor configured to surround the electric discharge prevention member at least in the vicinity of the inlet of the electric discharge prevention member, wherein the surrounding conductor surrounds the electric discharge prevention member over an extent which is equal to or longer than a predetermined distance H from the inlet toward an outlet of the electric discharge prevention member. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35)
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36. A plasma processing apparatus comprising:
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a processing container configured to be evacuated to a vacuum and provided with a dielectric window; a substrate holding unit configured to hold a substrate to be processed within the processing container; a dielectric window gas flow path that penetrates the dielectric window; a processing gas supply unit including an external gas supply path which is connected with the dielectric window gas flow path at the outside of the dielectric window when viewed from a plasma generation space within the processing container, the processing gas supply unit being configured to supply at least a part of a required processing gas into the processing container through the external gas supply path and the dielectric window gas flow path; and an electromagnetic wave supply unit configured to supply electromagnetic waves for gas-discharge into the processing container through the dielectric window, wherein, assuming that a distance between a center of the dielectric window and the dielectric window gas flow path is R and the wavelength of the electromagnetic waves is λ
g when the electromagnetic waves are propagated within the dielectric window, λ
g/4<
R<
5λ
g/8. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60)
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61. A plasma processing apparatus comprising:
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a processing container configured to be evacuated to a vacuum and provided with a dielectric window; a substrate holding unit configured hold a substrate to be processed within the processing container; a dielectric window gas flow path that penetrates the dielectric window; a processing gas supply device including a gas nozzle provided in the dielectric window, and an external gas supply path which is connected with the dielectric window gas flow path on a rear side or outside of the dielectric window when viewed from a plasma generation space within the processing container, the processing gas supply device being configured to supply at least a part of a required processing gas into the processing container through the external gas supply path and the dielectric window gas flow path; and an electromagnetic wave supply unit configured to supply electromagnetic waves into the processing container through the dielectric window, wherein the gas nozzle includes a through hole formed in the dielectric window, and a nozzle piece made of a dielectric material fitted in the through hole, and a plurality of longitudinal grooves, which extend in an axial direction from one end to the other end of the nozzle piece, are formed on an outer circumferential surface of the nozzle piece in parallel to each other. - View Dependent Claims (62, 63, 64, 65, 66, 67, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85)
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86-90. -90. (canceled)
Specification