MEMS Method and Structure
First Claim
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1. A method of manufacturing a microelectromechanical structure, the method comprising:
- forming a locker film on a first surface of a first substrate, the first substrate comprising a moveable mass region and a support region;
etching through the first substrate to release the moveable mass region from the support region, the etching stopping on the locker film; and
removing at least a portion of the locker film to release the moveable mass region.
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Abstract
MEMS structures and methods utilizing a locker film are provided. In an embodiment a locker film is utilized to hold and support a moveable mass region during the release of the moveable mass region from a surrounding substrate. By providing additional support during the release of the moveable mass, the locker film can reduce the amount of undesired movement that can occur during the release of the moveable mass, and preventing undesired etching of the sidewalls of the moveable mass.
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Citations
20 Claims
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1. A method of manufacturing a microelectromechanical structure, the method comprising:
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forming a locker film on a first surface of a first substrate, the first substrate comprising a moveable mass region and a support region; etching through the first substrate to release the moveable mass region from the support region, the etching stopping on the locker film; and removing at least a portion of the locker film to release the moveable mass region. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method of manufacturing a microelectromechanical structure, the method comprising:
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providing a first substrate with active devices located in the first substrate; forming a support film on a first surface of a second substrate; bonding the first substrate to the second substrate, the first surface facing the first substrate; releasing a moveable mass region within the second substrate, while supporting the moveable mass region with the support film; and removing at least a portion of the support film to remove the support of the support film. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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15. A microelectromechanical structure comprising:
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a moveable mass separated from a support region, the moveable mass being moveable relative to a support region; a first support film located on the moveable mass, the first support film having a first edge aligned with an edge of the moveable mass; and a second support film located on the support region, the second support film having a second edge aligned with an edge of the support region, wherein the first support film and the second support film comprise a same material. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification