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MEMS Method and Structure

  • US 20140264644A1
  • Filed: 03/14/2013
  • Published: 09/18/2014
  • Est. Priority Date: 03/12/2013
  • Status: Active Grant
First Claim
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1. A method of manufacturing a microelectromechanical structure, the method comprising:

  • forming a locker film on a first surface of a first substrate, the first substrate comprising a moveable mass region and a support region;

    etching through the first substrate to release the moveable mass region from the support region, the etching stopping on the locker film; and

    removing at least a portion of the locker film to release the moveable mass region.

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