Dual Control Modes
First Claim
1. A method for using different variables based on a state associated with a plasma system, comprising:
- determining whether the state associated with the plasma system is a first state or a second state;
determining a first variable upon determining that the state is the first state, the first variable determined based on a measurement at a communication medium, the communication medium located between a radio frequency (RF) generator and a plasma chamber of the plasma system;
determining a second variable upon determining that the state is the second state, the second variable determined based on a measurement at the communication medium;
determining whether the second variable exceeds a first threshold;
providing an instruction to reduce power supplied to the plasma chamber upon determining that the second variable exceeds the first threshold; and
providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold,wherein the method is executed by one or more processors.
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Accused Products
Abstract
Systems and methods for using variables based on a state associated with a plasma system. A method includes determining whether the state associated with the plasma system is a first state or a second state and determining a first variable upon determining that the state is the first state. The first variable is determined based on a measurement at a communication medium. The method further includes determining a second variable upon determining that the state is the second state. The second variable is determined based on a measurement at the communication medium. The method includes determining whether the second variable exceeds a first threshold, providing an instruction to reduce power supplied to a plasma chamber upon determining that the second variable exceeds the first threshold, and providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold.
39 Citations
20 Claims
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1. A method for using different variables based on a state associated with a plasma system, comprising:
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determining whether the state associated with the plasma system is a first state or a second state; determining a first variable upon determining that the state is the first state, the first variable determined based on a measurement at a communication medium, the communication medium located between a radio frequency (RF) generator and a plasma chamber of the plasma system; determining a second variable upon determining that the state is the second state, the second variable determined based on a measurement at the communication medium; determining whether the second variable exceeds a first threshold; providing an instruction to reduce power supplied to the plasma chamber upon determining that the second variable exceeds the first threshold; and providing an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold, wherein the method is executed by one or more processors. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method for using ion energy for states associated with a plasma system, comprising:
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determining whether the state associated with the plasma system is a first state or a second state; determining an ion energy associated with a plasma chamber upon determining that the state is the second state; determining whether the ion energy matches a first ion energy threshold; and providing an instruction to change power supplied to the plasma chamber upon determining that the ion energy exceeds the first ion energy threshold, wherein the method is executed by one or more processors. - View Dependent Claims (13, 14, 15)
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16. A plasma system for using different variables based on a state associated with the system, comprising:
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a plasma chamber including; a chuck for supporting a substrate; and an upper electrode located above the chuck; an impedance matching circuit coupled to the plasma chamber via a first communication medium; a radio frequency (RF) generator coupled to the impedance matching circuit via a second communication medium; a sensor coupled to the first communication medium for generating a first measurement and a second measurement from RF signals transferred via the first communication medium; a processor coupled to the RF generator, the processor configured to; determine whether the state associated with the plasma system is a first state or a second state; determine a first variable upon determining that the state is the first state, the first variable determined based on the first measurement; determine a second variable upon determining that the state is the second state, the second variable determined based on the second measurement; determine whether the second variable exceeds a first threshold; provide an instruction to reduce power supplied to the plasma chamber upon determining that the second variable exceeds the first threshold; and provide an instruction to increase power supplied to the plasma chamber upon determining that the second variable is below the first threshold. - View Dependent Claims (17)
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18. A plasma system for using different variables based on a state associated with the system, comprising:
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a plasma chamber including; a chuck for supporting a substrate; and an upper electrode on top of the chuck; an impedance matching circuit coupled to the plasma chamber via a first communication medium; a radio frequency (RF) generator coupled to the impedance matching circuit via a second communication medium; a sensor for generating a first measurement and a second measurement from RF signals transferred via the first communication medium; a processor coupled to the RF generator, the processor configured to; determine whether a state associated with the plasma system is a first state or a second state; determine an ion energy associated with the plasma chamber upon determining that the state is the second state, the ion energy determined based on the first measurement; determine whether the ion energy exceeds a first ion energy threshold; provide an instruction to reduce power supplied to the plasma chamber upon determining that the ion energy exceeds the first ion energy threshold; and provide an instruction to increase power supplied to the plasma chamber upon determining that the ion energy is below the first ion energy threshold. - View Dependent Claims (19, 20)
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Specification