DISPLAY APPARATUS INCORPORATING DUAL-LEVEL SHUTTERS

• US 20140267196A1
• Filed: 03/13/2013
• Published: 09/18/2014
• Est. Priority Date: 03/13/2013
• Status: Active Grant

• Current Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: Pixtronix, Incorporated (Qualcomm, Inc.)
• Inventors: Villarreal, Javier, Brosnihan, Timothy, Andersson, Mark B., Buckley, Edward, Fike, Eugene
• Granted Patent: US 9,134,530 B2
• Time in Patent Office: Days
• US Class Current: 345/204
• CPC Class Codes: B81B 2201/045 Optical switches
• CPC Class Codes: B81B 3/0054 For holding or placing an element in a given position
• CPC Class Codes: G02B 26/02 for controlling the intensity of light G02B26/004 takes precedence
• CPC Class Codes: G02B 26/023 comprising movable attenuating elements, e.g. neutral density filters
• CPC Class Codes: G09G 5/003 Details of a display terminal, the details relating to the control arrangement of the display terminal and to the interfaces thereto specific for a CRT G09G1/165; for a flat panel G09G3/2092

Abstract

This disclosure provides systems, methods and apparatus for modulating light to form an image on a display, as well as methods manufacturing such apparatus. The display apparatus includes shutters having asymmetric light obstructing portions extending out from opposing sides of a shutter aperture along an axis of motion of the shutter. Actuators move the shutters laterally along the axis of motion to move the shutter between fully closed, partially open, and fully open states to modulate light, thereby forming an image.

Claims

1. A apparatus comprising:

a first light blocking layer including an aperture formed therein; and

a shutter configured to be moved laterally along a first axis with respect to the light blocking layer by at least one actuator, the shutter including;

a first light obstructing portion having a dimension along the first axis which is smaller than a dimension of the aperture along the first axis; and

a second light obstructing portion having a dimension along the first axis which is greater than or equal to the dimension of the aperture along the first axis,

wherein the at least one actuator is configured to move the shutter into a first state in which neither the first or the second light obstructing portion substantially obstructs light passing through aperture, a second state in which the first light obstructing portion obstructs a fraction of light passing through the aperture, and a third state in which the second portion obstructs substantially all of the light passing through the aperture.

2. The apparatus of claim 1, wherein each of the first and second light obstructing portions of the shutter includes a proximal light obstructing and a distal light obstructing level, which are connected by sidewalls.

3. The apparatus of claim 2, wherein the at least one actuator includes an electrode positioned adjacent the shutter, and the proximal light obstructing level is positioned at about the same height over a substrate as a proximal edge of the electrode.

4. The apparatus of claim 3, wherein the distal light obstructing level is positioned at about the same height over a substrate as a distal edge of the electrode.

5. The apparatus of claim 3, wherein the distal light obstructing level is positioned at about the same height over a substrate as a distal edge of the electrode.

6. The apparatus of claim 2, wherein the proximal light obstructing level is spaced from the first light blocking layer by about the same distance as the distal light obstructing level is spaced from a second light blocking layer positioned opposite the shutter from the first light blocking layer.

7. The apparatus of claim 2, wherein the proximal light obstructing level is spaced from the first light blocking layer by a distance that is less than about 3 microns different from a distance with which the distal light obstructing level is spaced from a second light blocking layer positioned opposite the shutter from the first light blocking layer.

8. The apparatus of claim 1, wherein the at least one actuator includes a first actuator and a second actuator.

9. The apparatus of claim 8, wherein the first actuator is configured to, upon actuation, pull the shutter into the first state.

10. The apparatus of claim 9, wherein the second actuator is configured to, upon actuation, pull the shutter into the third state.

11. The apparatus of claim 8, wherein the first and second actuators are configured such that when neither the first or second actuator is actuated, the shutter is in the second state.

12. The apparatus of claim 1, comprising:

a display including the shutter;

a processor that is configured to communicate with the display, the processor being configured to process image data; and

a memory device that is configured to communicate with the processor.

13. The apparatus of claim 12, further comprising:

a driver circuit configured to send at least one signal to the display; and

wherein the processor is further configured to send at least a portion of the image data to the driver circuit.

14. The apparatus of claim 12, further comprising:

an image source module configured to send the image data to the processor, wherein the image source module comprises at least one of a receiver, transceiver, and transmitter.

15. The apparatus of claim 12, further comprising:

an input device configured to receive input data and to communicate the input data to the processor.

16. A method of manufacturing a display element, comprising:

defining a first aperture in a first light blocking layer;

depositing a first layer of sacrificial material over the first light blocking layer;

depositing at least a first layer of structural material over the first layer of sacrificial material; and

patterning at least the first layer of structural material to define;

a perimeter of a shutter and a shutter aperture through the shutter, wherein the shutter perimeter and the shutter aperture are configured such that the shutter includes asymmetric first and second light obstructing portions positioned on opposite sides of the shutter aperture along an axis of motion of the shutter; and

at least one actuator configured to move the shutter along the axis of motion into a relaxed state in which neither the first nor the second light obstructing portions substantially obstructs light passing through the first aperture, a first actuated state in which the first light obstructing portion obstructs a fraction of light passing through the first aperture, and a second actuated state in which the second light obstructing portion obstructs substantially all of the light passing through the first aperture.

17. The method of claim 16, further comprising depositing a second layer of sacrificial material over the first layer of structural material, wherein depositing at least a first layer of structural material over the first layer of sacrificial material includes depositing a second layer of structural material over the second layer of sacrificial material.

18. The method of claim 17, wherein patterning at least the first layer of structural material includes patterning the first layer of structural material prior to the deposition of the second layer of sacrificial material and then patterning the second layer of structural material after the deposition of the second layer of structural material.

19. The method of claim 18, further comprising patterning the second layer of sacrificial material to form a recess in the second layer of sacrificial material surrounding the shutter aperture defined in the first layer of structural material.

20. The method of claim 19, wherein depositing the second layer of structural material includes coating sidewalls of the recess in the second sacrificial layer with the second layer of structural layer.