Lithography System with an Embedded Cleaning Module
First Claim
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1. A lithography system, comprising:
- an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and
a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.
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Abstract
The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.
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Citations
20 Claims
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1. A lithography system, comprising:
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an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A lithography system, comprising:
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an exposing module designed to perform a lithography exposing process and configured in an enclosed chamber maintained in a vacuum environment; and a cleaning module integrated with the exposing module, wherein the cleaning module includes a cleaning structure with an attraction mechanism to remove particles and a handling mechanism that is designed to secure and transfer the cleaning structure. - View Dependent Claims (14, 15, 16, 17)
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18. A method, comprising:
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loading a mask into a lithography system designed to perform a lithography exposing process, the lithography system being embedded with a cleaning module having an attraction mechanism; securing the mask to a mask stage; performing a lithography exposing process by the lithography system to a semiconductor wafer using the mask; and cleaning the mask by the cleaning module. - View Dependent Claims (19, 20)
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Specification