SELF-CALIBRATING PRESSURE SENSOR SYSTEM WITH PRESSURE SENSOR AND REFERENCE SENSOR THAT SHARE COMMON SEALED CHAMBER

• US 20140298884A1
• Filed: 12/09/2013
• Published: 10/09/2014
• Est. Priority Date: 04/04/2013
• Status: Abandoned Application

• Current Assignee: MKS Instruments Incorporated
• Original Assignee: MKS Instruments Incorporated
• Inventors: Bart, Stephen F., Gu, Lei, Mindlin, Leonid
• Application Number:
  US14/101,177
• Publication Number:
  US 20140298884A1
• Time in Patent Office: Days
• US Class Current: 73/1.63
• CPC Class Codes: G01L 27/00 Testing or calibrating of apparatus for measuring fluid pressure
• CPC Class Codes: G01L 9/0047 Diaphragm with non uniform thickness, e.g. with grooves, bosses or continuously varying thickness
• CPC Class Codes: G01L 9/0072 using variations in capacitance
• CPC Class Codes: Y10T 29/49826 Assembling or joining

Abstract

A self-calibrating pressure sensor system may measure the pressure of a gas or liquid. The system may include a pressure sensor, a reference sensor, and a drift compensation system. The pressure sensor may include a pressure-sensing flexible diaphragm with one side exposed to the gas or liquid and another side forming a wall of a sealed chamber. The reference sensor may include a reference flexible diaphragm that has two sides that are both within or exposed to the same sealed chamber. The drift compensation system may produce information that is indicative of the pressure of the gas or liquid based on the signal from the pressure sensor, and compensate for drift in this signal based on changes in the signal from the reference sensor. The pressure-sensing flexible diaphragm and the reference flexible diaphragm may be made at substantially the same time by depositing or growing a single layer of material in a single continuous step.

Claims

1. A self-calibrating pressure sensor system for measuring the pressure of a gas or liquid comprising:

a pressure sensor that includes a pressure-sensing flexible diaphragm positioned such that one side is exposed to the gas or liquid and another side forms a wall of a sealed chamber;

a reference sensor that includes a reference flexible diaphragm that has two sides that are both within or exposed to the sealed chamber; and

a drift compensation system that;

receives a signal from the pressure sensor and from the reference sensor;

produces information that is indicative of the pressure of the gas or liquid based on the signal from the pressure sensor; and

compensates for drift in the signal from the pressure sensor based on changes in the signal from the reference sensor.

2. The self-calibrating pressure sensor system of claim 1 wherein:

the pressure sensor includes a pressure electrode that is spaced from the pressure-sensing flexible diaphragm and that forms a capacitor with the pressure-sensing flexible diaphragm that has a capacitance that varies as a function of the pressure of the liquid or gas;

the pressure sensor has characteristic planar dimensions of between 1 and 1000 microns, characteristic conformal layer thickness of between 0.1 and 20 microns, and one or more layers of silicon, silicon dioxide, silicon nitride, or metal; and

the space between the pressure electrode and the pressure-sensing diaphragm is not exposed to the gas or liquid.

3. The self-calibrating pressure sensor system of claim 2 wherein the pressure electrode has two sides, both of which are isolated from the gas or liquid.

4. The self-calibrating pressure sensor system of claim 3 wherein the pressure electrode is within the sealed chamber.

5. The self-calibrating pressure sensor system of claim 2 wherein:

the reference sensor includes a reference electrode that is spaced from the reference flexible diaphragm and that forms a capacitor with the reference flexible diaphragm that has a capacitance that does not vary in response to changes in the pressure of the liquid or gas;

the reference sensor has characteristic planar dimensions of between 1 and 1000 microns, characteristic conformal layer thickness of between 0.1 and 20 microns, and one or more layers of silicon, silicon dioxide, silicon nitride, or metal; and

the space between the reference electrode and the reference flexible diaphragm is not exposed to the gas or liquid.

6. The self-calibrating pressure sensor system of claim 5 wherein the reference electrode has two sides, both of which are isolated from the gas or liquid.

7. The self-calibrating pressure sensor system of claim 6 wherein the reference electrode is within the sealed chamber.

8. The self-calibrating pressure sensor system of claim 1 wherein both flexible diaphragms are substantially flat and made of a single crystal material.

9. The self-calibrating pressure sensor system of claim 1 wherein both flexible diaphragms are substantially identical in size, shape, thickness, and material composition.

10. The self-calibrating pressure sensor of system of claim 9 wherein the pressure sensor and the reference sensor are substantially identical in size, shape, thickness, and material composition.

11. The self-calibrating pressure sensor system of claim 1 further comprising an environment sensor positioned so as to sense a change in the environment in which the pressure sensor is placed, but not a change in the pressure of the gas or liquid.

12. A method of making a self-calibrating pressure sensor system for measuring the pressure of a gas or liquid comprising:

making a pressure sensor that includes a pressure-sensing flexible diaphragm positioned such that one side is exposed to the gas or liquid; and

making a reference sensor that includes a reference flexible diaphragm positioned such that no side is exposed to the gas or liquid,

wherein the pressure-sensing flexible diaphragm and the reference flexible diaphragm are made at substantially the same time by depositing or growing a single layer of material in a single continuous step.

13. The method of claim 12 wherein the single layer of material is a single crystal material.

14. The method of claim 12 wherein the making of the pressure sensor and the reference sensor includes making planar dimensions of between 1 and 1000 microns, characteristic conformal layer thickness of between 0.1 and 20 microns, and one or more layers of silicon, silicon dioxide, silicon nitride, or metal.

15. The method of claim 12 wherein:

the other side of the pressure-sensing flexible diaphragm forms a wall of a sealed chamber; and

both sides of the reference flexible diaphragm are within the sealed chamber.

16. The method of claim 12 wherein both flexible diaphragms are substantially flat and made of a single crystal material.

17. The method of claim 12 wherein both flexible diaphragms are substantially identical in size, shape, and thickness.

18. The method of claim 12 the pressure sensor and the reference sensor are substantially identical in size, shape, thickness, and material composition.

19. The method of claim 12 further comprising making an environment sensor positioned so as to sense changes in the environment in which the pressure sensor is placed, but not changes in the pressure of the gas or liquid.

20. The method of claim 12 wherein:

the pressure sensor includes an electrode that is spaced from the pressure-sensing flexible diaphragm and that forms a capacitor with the pressure-sensing flexible diaphragm that has a capacitance that varies as a function of the pressure of the liquid or gas; and

the reference sensor includes an electrode that is spaced from the reference flexible diaphragm and that forms a capacitor with the reference flexible diaphragm that has a capacitance that does not vary as a function of the pressure of the liquid or gas.

21. The method of claim 20 wherein:

the electrodes of the pressure sensor and the reference sensor are made at substantially the same time by depositing or growing a single layer of material in a single continuous step; and

the space between the electrode in the pressure sensor and the pressure-sensing flexible diaphragm and the space between the electrode in the reference sensor and the reference flexible diaphragm are made at substantially the same time by depositing or growing a single layer of material in a single continuous step.