×

DETAILING AND POLISHING PAD

  • US 20140325781A1
  • Filed: 05/01/2014
  • Published: 11/06/2014
  • Est. Priority Date: 05/03/2013
  • Status: Abandoned Application
First Claim
Patent Images

1. A polishing pad for use on a polishing tool, the polishing tool having a support surface for receiving the pad, the polishing pad comprising:

  • a polishing layer comprising a fabric polishing surface;

    a backing layer, the backing layer having an inner surface and outer surface;

    the outer surface of the backing layer adapted to mechanically or adhesively attach in removable fashion to the support surface of the polishing tool; and

    a non-foam, solid thermoplastic polymer middle layer in the form of a flexible sheet, the middle layer bonded to the polishing layer and the inner surface of the backing layer.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×