TRANSPARENT CONDUCTIVE OXIDES
First Claim
1. A method of forming a transparent conductive oxide film, comprising:
- depositing the transparent conductive oxide film in a pulsed DC reactive ion process with substrate bias; and
controlling at least one process parameter to provide at least one characteristic of the conductive oxide film at a particular value.
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Abstract
A method of deposition of a transparent conductive film from a metallic target is presented. A method of forming a transparent conductive oxide film according to embodiments of the present invention include depositing the transparent conductive oxide film in a pulsed DC reactive ion process with substrate bias, and controlling at least one process parameter to affect at least one characteristic of the conductive oxide film. The resulting transparent oxide film, which in some embodiments can be an indium-tin oxide film, can exhibit a wide range of material properties depending on variations in process parameters. For example, varying the process parameters can result in a film with a wide range of resistive properties and surface smoothness of the film.
3 Citations
26 Claims
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1. A method of forming a transparent conductive oxide film, comprising:
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depositing the transparent conductive oxide film in a pulsed DC reactive ion process with substrate bias; and controlling at least one process parameter to provide at least one characteristic of the conductive oxide film at a particular value. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of depositing a transparent conductive oxide film on a substrate, comprising:
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placing the substrate in a reaction chamber; adjusting power to a pulsed DC power supply coupled to a target in the reaction chamber; adjusting an RF bias power coupled to the substrate; adjusting gas flow into the reaction chamber; and providing a magnetic field at the target in order to direct deposition of the transparent conductive oxide film on the substrate in a pulsed-dc biased reactive-ion deposition process, wherein the transparent conductive oxide film exhibits at least one particular property. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26)
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Specification