SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
First Claim
1. A light emitting diode (LED), comprising:
- a substrate;
a semiconductor stack disposed on the substrate and comprising a gallium nitride (GaN)-based p-type semiconductor layer, a GaN-based active layer, and a GaN-based n-type semiconductor layer;
a p-electrode layer in ohmic contact with the p-type semiconductor layer and disposed between the substrate and the semiconductor stack; and
a transparent oxide layer disposed on the semiconductor stack and comprising a first surface comprising a concavo-convex pattern,wherein the semiconductor stack has a dislocation density of 5×
106/cm2 or less.
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Accused Products
Abstract
Disclosed are a semiconductor device and a method of fabricating the same. The method includes forming a first GaN layer, a sacrificial layer and a second GaN layer on a GaN substrate, wherein the sacrificial layer has a bandgap narrower than those of the GaN layers; forming a groove penetrating the second GaN layer and the sacrificial layer; growing GaN-based semiconductor layers on the second GaN layer to form a semiconductor stack; forming a support substrate on the semiconductor stack; and removing the GaN substrate from the semiconductor stack by etching the sacrificial layer. Accordingly, since the sacrificial layer is etched using the groove, the support substrate can be separated from the semiconductor stack without damaging the support substrate.
25 Citations
22 Claims
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1. A light emitting diode (LED), comprising:
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a substrate; a semiconductor stack disposed on the substrate and comprising a gallium nitride (GaN)-based p-type semiconductor layer, a GaN-based active layer, and a GaN-based n-type semiconductor layer; a p-electrode layer in ohmic contact with the p-type semiconductor layer and disposed between the substrate and the semiconductor stack; and a transparent oxide layer disposed on the semiconductor stack and comprising a first surface comprising a concavo-convex pattern, wherein the semiconductor stack has a dislocation density of 5×
106/cm2 or less. - View Dependent Claims (3, 4, 5)
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2. (canceled)
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6. An LED, comprising:
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a substrate; a semiconductor stack disposed on the substrate and comprising a GaN-based p-type semiconductor layer, a GaN-based active layer, and a GaN-based n-type semiconductor layer; a p-electrode layer in ohmic contact with the p-type semiconductor layer and disposed between the substrate and the semiconductor stack; an n-electrode layer disposed between the substrate and the semiconductor stack and connected to the n-type semiconductor layer through a through-hole penetrating the p-type semiconductor layer and the active layer; and an insulation layer insulating the p-electrode layer and the n-electrode layer from each other, wherein the semiconductor stack has a dislocation density of 5×
106/cm2 or less. - View Dependent Claims (7, 8, 9, 10)
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11. A method of fabricating an LED, the method comprising:
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forming a first GaN layer, a sacrificial layer, and a second GaN layer on a GaN substrate, the sacrificial layer having a bandgap narrower than bandgaps of the GaN layers; forming a groove penetrating the second GaN layer and the sacrificial layer; growing GaN-based semiconductor layers on the second GaN layer to form a semiconductor stack; forming a substrate on the semiconductor stack; and etching the sacrificial layer to remove the GaN substrate from the semiconductor stack. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of fabricating an LED, the method comprising:
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forming a GaN layer and a sacrificial layer on a GaN substrate, the sacrificial layer comprising a GaN-based semiconductor having a bandgap narrower than the bandgap of the GaN layer; growing GaN-based semiconductor layers on the sacrificial layer to form a semiconductor stack; forming a groove penetrating the semiconductor stack and the sacrificial layer; forming a substrate on the semiconductor stack; and etching the sacrificial layer to separate the GaN substrate from the semiconductor stack.
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22. (canceled)
Specification