COATING APPARATUS AND METHOD OF CLEANING SEALING UNIT

• US 20140352611A1
• Filed: 05/27/2014
• Published: 12/04/2014
• Est. Priority Date: 05/29/2013
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: MAKI, Tetsuya, TANOUE, Hayato
• Application Number:
  US14/287,593
• Publication Number:
  US 20140352611A1
• Time in Patent Office: Days
• US Class Current: 118/302
• CPC Class Codes: B05B 15/52 for removal of clogging particles
• CPC Class Codes: B05B 15/531 using backflow
• CPC Class Codes: B05B 15/55 using cleaning fluids
• CPC Class Codes: B05C 5/0254 Coating heads with slot-shaped outlet B05C5/0283 takes precedence
• CPC Class Codes: B08B 1/20 Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
• CPC Class Codes: B08B 3/022 Cleaning travelling work B08B3/042 takes precedence
• CPC Class Codes: B08B 3/04 Cleaning involving contact with liquid
• CPC Class Codes: G03F 7/16 Coating processes; Apparatus therefor applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74
• CPC Class Codes: H01L 21/6715 Apparatus for applying a liquid, a resin, an ink or the like H01L21/67126 takes precedence

Abstract

Provided is a coating apparatus which includes: a slit nozzle provided with a discharge port at a lower side of the slit nozzle, and configured to discharge a coating liquid from the discharge port; a moving mechanism configured to move the slit nozzle relative to a substrate; a sealing unit formed to extend along a longitudinal direction of the discharge port, and including a top surface which is brought into contact with the discharge port to seal the discharge port; a solvent reservoir configured to retain a solvent; and an immersing mechanism configured to immerse the sealing unit into the solvent retained in the solvent reservoir.

Claims

1. A coating apparatus, comprising:

a slit nozzle provided with a discharge port at a lower side of the slit nozzle, and configured to discharge a coating liquid from the discharge port;

a moving mechanism configured to move the slit nozzle relative to a substrate;

a sealing unit formed to extend along a longitudinal direction of the discharge port, and including a top surface which is brought into contact with the discharge port to seal the discharge port;

a solvent reservoir configured to retain a solvent; and

an immersing mechanism configured to immerse the sealing unit into the solvent retained in the solvent reservoir.

2. The apparatus of claim 1, wherein the immersing mechanism includes a lift mechanism configured to lift and lower the sealing unit.

3. The apparatus of claim 2, wherein the lift mechanism is configured to lift the sealing unit such that the sealing unit makes contact with the discharge port of the slit nozzle.

4. The apparatus of claim 3, further comprising:

a rotating mechanism configured to rotate the sealing unit such that the sealing unit is inverted upside down; and

a scraping unit configured to make contact with a bottom surface of the inverted sealing unit and to scrape the coating liquid adhering to the bottom surface of the inverted sealing unit,

wherein after the sealing unit is lifted by the lift mechanism such that the entire surface of the sealing unit is exposed from the solvent within the solvent reservoir and after the sealing unit is inverted upside down by the rotating mechanism, the scraping unit is brought into contact with the bottom surface of the inverted sealing unit and to scrape the coating liquid adhering to the bottom surface of the inverted sealing unit such that the scrapped coating liquid is dropped into the solvent reservoir.

5. The apparatus of claim 1, wherein at least the top surface of the sealing unit which is brought into contact with the discharge port is made of a resin.

6. The apparatus of claim 1, wherein the sealing unit is formed to have a cross section shape with at least partially linear section when viewed in the longitudinal direction.

7. A method of cleaning a sealing unit, for use in a coating apparatus,

wherein the coating apparatus includes:

a slit nozzle provided with a discharge port at a lower side thereof and configured to discharge a coating liquid from the discharge port;

a sealing unit formed to extend along a longitudinal direction of the discharge port and including a top surface which is brought into contact with the discharge port to seal the discharge port; and

a solvent reservoir configured to retain a solvent,

the method comprising;

exposing at least a portion of the sealing unit making contact with the discharge port from the solvent retained in the solvent reservoir;

bring the discharge port into contact with the top surface of the sealing unit such that the discharge port is sealed by the sealing unit; and

immersing the top surface of the sealing unit into the solvent retained in the solvent reservoir.