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MICROWAVE EMISSION MECHANISM, MICROWAVE PLASMA SOURCE AND SURFACE WAVE PLASMA PROCESSING APPARATUS

  • US 20140361684A1
  • Filed: 12/14/2012
  • Published: 12/11/2014
  • Est. Priority Date: 01/27/2012
  • Status: Active Grant
First Claim
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1. A microwave emission mechanism for emitting into a chamber a microwave generated by a microwave generation mechanism, in a plasma processing apparatus for performing plasma processing by generating a surface wave plasma in the chamber, the microwave emission mechanism comprising:

  • a transmission path through which the microwave is transmitted, the transmission path including a cylindrical outer conductor and an inner conductor coaxially disposed within the outer conductor; and

    an antenna section configured to emit into the chamber the microwave transmitted through the transmission path,wherein the antenna section includes;

    an antenna having a slot through which the microwave is emitted;

    a dielectric member through which the microwave emitted from the antenna is transmitted, a surface wave being formed on a surface of the dielectric member; and

    a closed circuit in which a surface current and a displacement current flow, the closed circuit having at least an inner wall of the slot and the surface and an inner portion of the dielectric member, andwherein when a wavelength of the microwave is λ

    0, a length of the closed circuit is nλ

    0±

    δ

    , where n is a positive integer and δ

    is a fine-tuning component including 0.

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