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UNDERLAYER FILM-FORMING COMPOSITION AND PATTERN FORMING PROCESS

  • US 20140363955A1
  • Filed: 06/04/2014
  • Published: 12/11/2014
  • Est. Priority Date: 06/11/2013
  • Status: Active Grant
First Claim
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1. A photoresist underlayer film-forming composition for use in lithography, comprising a novolak resin comprising recurring units of at least one type selected from the group consisting of a substituted or unsubstituted phenolphthalein, Phenol Red, Cresolphthalein, Cresol Red, and Thymolphthalein.

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