TRANSISTOR AND METHOD OF FABRICATING THE SAME
First Claim
1. A transistor comprising:
- a substrate;
a semiconductor layer provided on the substrate and having one side vertical to the substrate and the other side facing the one side;
a first electrode extending along the substrate and contacting the one side of the semiconductor layer;
a second electrode extending along the substrate and contacting the other side of the semiconductor layer;
a conductive wire disposed on the first electrode and spaced from the second electrode;
a gate electrode provided on the semiconductor layer; and
a gate insulating layer disposed between the semiconductor layer and the gate electrode,wherein the semiconductor layer, the first electrode, and the second electrode have a coplanar.
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Accused Products
Abstract
Provided is a transistor. The transistor includes: a substrate; a semiconductor layer provided on the substrate and having one side vertical to the substrate and the other side facing the one side; a first electrode extending along the substrate and contacting the one side of the semiconductor layer; a second electrode extending along the substrate and contacting the other side of the semiconductor layer; a conductive wire disposed on the first electrode and spaced from the second electrode; a gate electrode provided on the semiconductor layer; and a gate insulating layer disposed between the semiconductor layer and the gate electrode, wherein the semiconductor layer, the first electrode, and the second electrode have a coplanar.
6 Citations
14 Claims
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1. A transistor comprising:
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a substrate; a semiconductor layer provided on the substrate and having one side vertical to the substrate and the other side facing the one side; a first electrode extending along the substrate and contacting the one side of the semiconductor layer; a second electrode extending along the substrate and contacting the other side of the semiconductor layer; a conductive wire disposed on the first electrode and spaced from the second electrode; a gate electrode provided on the semiconductor layer; and a gate insulating layer disposed between the semiconductor layer and the gate electrode, wherein the semiconductor layer, the first electrode, and the second electrode have a coplanar. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method of fabricating a transistor, the method comprising:
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providing a substrate including a semiconductor layer; forming a gate insulating layer and a gate electrode at a position corresponding to a core of the semiconductor layer; forming an interlayer insulating layer covering the gate electrode and exposing both sides of the semiconductor layer; forming an electrode layer extending along the substrate and contacting the both sides of the semiconductor layer; forming a conductive layer covering the electrode layer; forming a first electrode and a second electrode spaced from the first electrode by patterning the electrode layer; and forming a conductive line on the first electrode by removing the conductive layer on the second electrode, wherein the first electrode contacts one side of the semiconductor layer and the second electrode contacts the other side of the semiconductor layer and has a coplanar with the semiconductor layer and the first electrode. - View Dependent Claims (10, 11, 12, 13, 14)
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Specification