Superlattice Structures and Infrared Detector Devices Incorporating the Same
First Claim
1. An infrared detector device comprising:
- a first contact layer;
an absorber superlattice region having a period defined by a first InAs layer, a strain-balancing structure, a second InAs layer, and an InAsSb layer, wherein the strain-balancing structure comprises an arbitrary alloy sequence comprising at least one constituent element of aluminum and phosphorus;
a unipolar electron or hole barrier layer adjacent to the absorber superlattice region; and
a second contact layer adjacent to the unipolar electron or hole barrier layer.
3 Assignments
0 Petitions
Accused Products
Abstract
Embodiments of strain-balanced superlattice infrared detector devices and their fabrication are disclosed. In one embodiment, an infrared detector device includes a first contact layer, and absorber superlattice region, a wider gap unipolar barrier region, and a second contact layer. The absorber superlattice region has a period defined by a first InAs layer, strain-balancing structure, a second InAs layer, and an InAsSb layer. The strain-balancing structure comprises an arbitrary alloy layer sequence containing at least one constituent element of aluminum or phosphor, e.g., InGaAs, AlInAs InAsP. In another embodiment, the absorber superlattice region has a period defined by a first InAs layer, first strain-balancing structure, a second InAs layer, a first GaSb layer, a second strain-balancing structure, and a second GaSb layer. The first strain-balancing structure includes at least one constituent element of aluminum or phosphor, e.g., InGaAs, AlInAs InAsP. The second strain-balancing structure includes GaInSb and GaSb.
-
Citations
16 Claims
-
1. An infrared detector device comprising:
-
a first contact layer; an absorber superlattice region having a period defined by a first InAs layer, a strain-balancing structure, a second InAs layer, and an InAsSb layer, wherein the strain-balancing structure comprises an arbitrary alloy sequence comprising at least one constituent element of aluminum and phosphorus; a unipolar electron or hole barrier layer adjacent to the absorber superlattice region; and a second contact layer adjacent to the unipolar electron or hole barrier layer. - View Dependent Claims (2, 3, 4, 5)
-
-
6. An infrared detector device comprising:
-
a first contact layer; an absorber superlattice region, the absorber superlattice region having a period defined by a first InAs layer, a strain-balancing structure, a second InAs layer, and a GaSb layer, wherein the strain-balancing structure comprises a single strain-balancing layer or an arbitrary sequence of strain-balancing layers; a unipolar electron or hole barrier layer adjacent to the absorber superlattice region, and a second contact layer adjacent to the unipolar electron or hole barrier layer. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13)
-
-
14. An infrared detector device comprising:
-
a first contact layer; an absorber superlattice region having a period defined by; an AlInAs layer; and two or more alternating InAsSb layers of an InAsSby1 layer and an InAsSby2 layer; a unipolar electron or hole barrier layer adjacent to the absorber superlattice region, and a second contact layer adjacent to the unipolar electron or hole barrier layer. - View Dependent Claims (15, 16)
-
Specification