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Methods for Coating a Substrate with an Amphiphilic Compound

  • US 20150001555A1
  • Filed: 09/17/2014
  • Published: 01/01/2015
  • Est. Priority Date: 07/13/2007
  • Status: Active Grant
First Claim
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1. A semiconductor device comprising:

  • a substrate;

    at least one dielectric region formed above the substrate, the at least one dielectric region having a surface on a side thereof opposite the substrate;

    at least one conductive region formed above the substrate adjacent to the at least one dielectric region; and

    an amphiphilic surface modifier layer formed on the surface of the at least one dielectric region to increase the hydrophilicity of the surface of the at least one dielectric region.

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