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Methods Of Depositing A Metal Alloy Film

  • US 20150004316A1
  • Filed: 06/26/2014
  • Published: 01/01/2015
  • Est. Priority Date: 06/26/2013
  • Status: Active Grant
First Claim
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1. A method of depositing an alloy film, the method comprising:

  • positioning a substrate within a processing chamber;

    exposing at least a portion of the substrate to a metal halide precursor to provide a first metal on the substrate;

    purging unreacted metal halide precursor from the processing chamber; and

    exposing the portion of the substrate to an organometallic reducing agent comprising a second metal different from the first metal to deposit the second metal on the substrate resulting in an alloy of the first metal and the second metal.

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