MASK FOR DEPOSITION

• US 20150007768A1
• Filed: 03/18/2014
• Published: 01/08/2015
• Est. Priority Date: 07/08/2013
• Status: Active Grant

• Current Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Original Assignee: Samsung Display Company Limited (Samsung Electronics Co. Ltd.)
• Inventors: LEE, Sang Yun
• Granted Patent: US 9,666,837 B2
• Time in Patent Office: Days
• US Class Current: 118/504
• CPC Class Codes: B05B 12/20 Masking elements, i.e. elements defining uncoated areas on an object to be coated
• CPC Class Codes: B05C 21/005 Masking devices stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20
• CPC Class Codes: C23C 14/042 using masks
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/166 using selective deposition, e.g. using a mask

Abstract

A mask for deposition includes a plurality of deposition pattern parts arranged spaced apart from each other in a first direction, and a plurality of pattern openings defined in each deposition pattern part; a plurality of dummy pattern parts disposed at opposing sides of the plurality of deposition pattern parts in the first direction, respectively, and a plurality of recesses defined in each dummy pattern part; and a plurality of fixing parts respectively disposed at external sides of outermost dummy pattern parts among the plurality of dummy pattern parts, in the first direction. A maximum thickness of the each dummy pattern part is equal to or larger than a maximum thickness of the each deposition pattern part, and is smaller than a maximum thickness of each fixing part.

Claims

1. A mask for deposition, comprising:

a plurality of deposition pattern parts arranged spaced apart from each other in a first direction, and a plurality of pattern openings defined in each deposition pattern part;

a plurality of dummy pattern parts disposed at opposing sides of the plurality of deposition pattern parts in the first direction, respectively, and a plurality of recesses defined in each dummy pattern part; and

a plurality of fixing parts respectively disposed at external sides of outermost dummy pattern parts among the plurality of dummy pattern parts, in the first direction,

wherein a maximum thickness of the each dummy pattern part is equal to or larger than a maximum thickness of the each deposition pattern part, and is smaller than a maximum thickness of each fixing part.

2. The mask for deposition of claim 1, wherein the maximum thickness of the each dummy pattern part is the same as the maximum thickness of the each deposition pattern part.

3. The mask for deposition of claim 2, wherein

the pattern openings comprise:

first pattern openings open at a first surface of the mask, and

second pattern openings respectively connected with the first pattern openings, disposed under the first pattern openings in a thickness direction of the mask, and open at a second surface of the mask opposite to the first surface, and

the recesses are open at a same surface of the mask as the second pattern openings are open, and have a same shape as the second pattern openings.

4. The mask for deposition of claim 3, wherein

the each dummy pattern part comprises a plurality of dummy protrusions defined by the plurality of recesses,

the each deposition pattern part comprises a plurality of pattern protrusions defined by the plurality of pattern openings, and

distal ends of the plurality of dummy protrusions are at a same distance from the first surface as those of the plurality of pattern protrusions.

5. The mask for deposition of claim 1, wherein the maximum thickness of the each dummy pattern part is larger than the maximum thickness of the each deposition pattern part.

6. The mask for deposition of claim 5, wherein

the pattern openings comprise:

first pattern openings open at a first surface of the mask, and

second pattern openings respectively connected with the first pattern openings, disposed under the first pattern openings in a thickness direction of the mask, and open at a second surface of the mask opposite to the first surface, and

the recesses are open at a same surface of the mask as the second pattern openings are open, and have a same shape as the second pattern openings.

7. The mask for deposition of claim 6, wherein

the each dummy pattern part comprises a plurality of dummy protrusions defined by the plurality of recesses,

the each deposition pattern part comprises a plurality of pattern protrusions defined by the plurality of pattern openings, and

distal ends of the plurality of dummy protrusions are further from the first surface than those of the plurality of pattern protrusions, and a distance of the distal ends of the plurality of dummy protrusions from the first surface decreases in a direction from a fixing part to a deposition pattern part.

8. The mask for deposition of claim 1, wherein

a first unit region is a portion of the mask comprising one recess, a second unit region is a portion of the mask comprising one pattern opening, and a third unit region is a portion of a fixing part of the mask having a same length as that of the first unit region in the first direction, and

a volume of mask material of the first unit region is larger than a volume of the mask material of the second unit region, and is smaller than a volume of the mask material of the third unit region.

9. The mask for deposition of claim 1, wherein the plurality of dummy pattern parts surrounds the plurality of deposition pattern parts, respectively.

10. A mask for deposition, comprising:

a plurality of deposition pattern parts arranged spaced apart from each other in a first direction, and a plurality of pattern openings defined in each deposition pattern part and comprising;

first pattern openings open at a first surface of the mask, and

second pattern openings respectively connected with the first pattern openings, disposed under the first pattern openings in a thickness direction of the mask, and open at a second surface of the mask opposite to the first surface;

a plurality of dummy pattern parts disposed at opposing sides of the plurality of deposition pattern parts in the first direction, respectively, and a plurality of recesses defined in each dummy pattern part and open at a same surface of the mask as the first pattern openings are open; and

a plurality of fixing parts respectively disposed at external sides of outermost dummy pattern parts among the plurality of dummy pattern parts, in the first direction.

11. The mask for deposition of claim 10, wherein a maximum thickness of the each dummy pattern part is larger than a maximum thickness of the each deposition pattern part, and is the same as a maximum thickness of each fixing part.

12. The mask for deposition of claim 10, wherein the recesses have a same shape as that of the first pattern openings.

13. The mask for deposition of claim 10, wherein

a first unit region is a portion of the mask comprising one recess, a second unit region is a portion of the mask comprising one pattern opening, and a third unit region is a portion of a fixing part of the mask having at a same length as that of the first unit region in the first direction,

a volume of mask material of the first unit region is larger than a volume of the mask material of the second unit region, and is smaller than a volume of the mask material of the third unit region.

14. The mask for deposition of claim 10, wherein the plurality of dummy pattern parts surrounds the plurality of deposition pattern parts, respectively.

15. A mask for deposition, comprising:

a plurality of deposition pattern parts spaced apart from each other in a first direction, and a plurality of pattern openings defined in each deposition pattern part;

a plurality of dummy pattern parts disposed at opposing sides of the plurality of deposition pattern parts in the first direction, respectively, and a plurality of recesses defined in each dummy pattern part; and

a plurality of fixing parts respectively disposed at external sides of outermost dummy pattern parts among the plurality of dummy pattern parts, in the first direction,

wherein an average thickness of the each dummy pattern part is larger than an average thickness of the each deposition pattern part, and is smaller than an average thickness of each fixing part.

16. The mask for deposition of claim 15, wherein

the pattern openings comprise:

first pattern openings open at a first surface of the mask, and

second pattern openings respectively connected with the first pattern openings, disposed under the first pattern openings in a thickness direction of the mask, and open at a second surface of the mask opposite to the first surface, and

the recesses are open at a same surface of the mask as the second pattern openings are open, and have a same shape as the second pattern openings.

17. The mask for deposition of claim 16, wherein

the each dummy pattern part comprises a plurality of dummy protrusions defined by the plurality of recesses,

the each deposition pattern part comprises a plurality of pattern protrusions defined by the plurality of pattern openings, and

distal ends of the plurality of dummy protrusions are at a same distance from the first surface as those of the plurality of pattern protrusions.

18. The mask for deposition of claim 16, wherein

the each dummy pattern part comprises a plurality of dummy protrusions defined by the plurality of recesses,

the each deposition pattern part comprises a plurality of pattern protrusions defined by the plurality of pattern openings, and

distal ends of the plurality of dummy protrusions are further from the first surface than those of the plurality of pattern protrusions, and a distance of the distal ends of the dummy protrusions from the first surface decreases in a direction from a fixing part to a deposition pattern part.

19. The mask for deposition of claim 15, wherein

the pattern openings comprise:

first pattern openings, and

second pattern openings respectively connected with the first pattern openings and disposed under the first pattern openings in a thickness direction of the mask, and

the recesses have a same shape as that of the first pattern openings.

20. The mask for deposition of claim 15, wherein the plurality of dummy pattern parts surrounds the plurality of deposition pattern parts, respectively.