CHARGED PARTICLE INSPECTION METHOD AND CHARGED PARTICLE SYSTEM

• US 20150008331A1
• Filed: 06/19/2014
• Published: 01/08/2015
• Est. Priority Date: 09/06/2005
• Status: Active Grant

• Current Assignee: Carl Zeiss Microscopy GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Applied Materials Israel Limited (Applied Materials Incorporated), CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: KEMEN, Thomas, KNIPPELMEYER, Rainer, SCHUBERT, Stefan
• Granted Patent: US 9,324,537 B2
• Time in Patent Office: Days
• US Class Current: 250/396.R
• CPC Class Codes: H01J 2237/0435 Multi-aperture
• CPC Class Codes: H01J 2237/0453 multiple apertures
• CPC Class Codes: H01J 2237/04922 electromagnetic
• CPC Class Codes: H01J 2237/04924 electrostatic
• CPC Class Codes: H01J 2237/04926 combined
• CPC Class Codes: H01J 2237/15 Means for deflecting or directing discharge
• CPC Class Codes: H01J 2237/2446 Position sensitive detectors
• CPC Class Codes: H01J 2237/2448 Secondary particle detectors
• CPC Class Codes: H01J 2237/2561 electron
• CPC Class Codes: H01J 2237/2817 Pattern inspection
• CPC Class Codes: H01J 2237/31774 Multi-beam
• CPC Class Codes: H01J 37/04 Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement electron or ion-optical systems for localised treatment of materials H01J37/3007; discharge control means in gas filled discharge tubes H01J37/32009
• CPC Class Codes: H01J 37/045 Beam blanking or chopping, i.e. arrangements for momentarily interrupting exposure to the discharge
• CPC Class Codes: H01J 37/09 Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
• CPC Class Codes: H01J 37/145 Combinations of electrostatic and magnetic lenses
• CPC Class Codes: H01J 37/147 Arrangements for directing or deflecting the discharge along a desired path H01J37/045 take precedence; lenses H01J37/10
• CPC Class Codes: H01J 37/244 Detectors; Associated components or circuits therefor
• CPC Class Codes: H01J 37/3177 Multi-beam, e.g. fly's eye, comb probe

Abstract

The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

Claims

1-4. -4. (canceled)

5. A charged particle system comprising:

at least one charged particle source;

a first multi aperture plate disposed downstream of the at least one charged particle source, the first multi aperture plate comprising a plurality of apertures;

a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate comprising a plurality of apertures;

a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates;

wherein the at least one charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate.

6. The charged particle system according to claim 5, wherein the plural aperture pairs are arranged such that the center of the aperture of the first multi aperture plate is, when seen in the direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced by a distance relative to the center of the aperture of the second multi aperture plate, the distance being less than a diameter of the aperture of the first multi aperture plate.

7. The charged particle system according to claim 6, wherein the distance is greater than about 0.01 times the diameter of the aperture of the first multi aperture plate.

8. The charged particle system according to claim 6, wherein the plural aperture pairs comprise a first group of aperture pairs which are arranged such that the center of the aperture of the first multi aperture plate is, when seen in the direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced by a first distance relative to the center of the aperture of the second multi aperture plate, and wherein the plural aperture pairs comprise a second group of aperture pairs which are arranged such that that the center of the aperture of the first multi aperture plate is, when seen in the direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced by a second distance relative to the center of the aperture of the second multi aperture plate, wherein the second distance is at least 1.05 times the first distance.

9. The charged particle system according to claim 8, wherein the plural aperture pairs comprise a third group of aperture pairs which are arranged such that the center of the aperture of the first multi aperture plate is, when seen in the direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced by a third distance relative to the center of the aperture of the second multi aperture plate, wherein the third distance is greater than the first and second distances, and at least 1.10 times the first distance.

10. The charged particle system according to claim 5, wherein the apertures of the first multi aperture plate comprised in the plural aperture pairs form a first pattern of apertures, and wherein the apertures of the second multi aperture plate comprised in the plural aperture pairs form a second pattern of apertures which is different from the first pattern.

11. The charged particle system according to one of claim 5, further comprising a beamstop, wherein the first and second multi aperture plates and the beam stop are arranged such that a first number of primary charged particle beamlets bypasses the beam stop when the first voltage difference is applied and further such that a second number of primary charged particle beamlets bypasses the beam stop when the second voltage is applied.

12. The charged particle system according to claim 11, wherein the second number is at least one and less than the first number, and wherein a third number of primary charged particle beamlets is incident on the beam stop when the second voltage is applied, wherein the third number is equal to a difference between the first and second numbers.

13. The charged particle system according to claim 11, wherein the second number is zero.

14. The charged particle system according to claim 13, further comprising a third multi aperture plate disposed upstream of the first multi aperture plate.

15. The charged particle system according to claim 14, wherein the third multi aperture plate comprises a plurality of apertures and is arranged such that the aperture pairs each further have an associated aperture of the third multi aperture plate, wherein the associated aperture of the third multi aperture plate is arranged such that a center thereof is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, substantially aligned with the center of the aperture of the first multi aperture plate of the aperture pair.

16. The charged particle system according to claim 14, wherein the controller is further configured to selectively apply at least third and fourth voltage differences between the first and third multi aperture plates.

17-33. -33. (canceled)

34. A particle-optical component for manipulating a plurality of beamlets of charged particles, the particle-optical component comprising:

a first multi aperture plate comprising a plurality of apertures and a second multi aperture plate comprising a plurality of apertures, the first and second multi aperture plates forming a gap between them,

a controller configured to selectively apply at least a first voltage difference between the first and second multi aperture plates to generate at least a first electrical field between them,

wherein the first and second multi aperture plates are configured and positioned relative to each other such that the first electrical field generated changes a divergence of a set of charged particle beamlets traversing the particle-optical component upon exit from the particle-optical component.

35. The particle-optical component according to claim 34, wherein the divergence is changed such that an angle between two charged particle beamlets exiting the particle-optical component is increased or decreased by at least 0.01 mrad.

36. The particle-optical component according to claim 34, wherein the divergence is changed such that an angle formed between a peripheral charged particle beamlet having exited the charged particle component and the second multi aperture plate is increased or decreased by at least 0.01 mrad.