Semiconductor Device with Vertical Transistor Channels and a Compensation Structure
First Claim
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1. A semiconductor device, comprising:
- transistor cells having vertical channels perpendicular to a first surface of a semiconductor portion;
a buried compensation structure between the transistor cells and a second surface of the semiconductor portion parallel to the first surface, the compensation structure comprising first areas and second areas alternatingly arranged along a lateral direction parallel to the first surface; and
a contiguous impurity layer of a first conductivity type separating the transistor cells and the compensation structure.
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Abstract
A semiconductor device includes transistor cells with vertical channels perpendicular to a first surface of a semiconductor portion. A buried compensation structure in the semiconductor portion between the transistor cells and a second surface of the semiconductor portion parallel to the first surface includes first areas and second areas. The first and second areas are alternatingly arranged along a lateral direction parallel to the first surface. A contiguous impurity layer of a first conductivity type separates the transistor cells from the buried compensation structure.
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Citations
20 Claims
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1. A semiconductor device, comprising:
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transistor cells having vertical channels perpendicular to a first surface of a semiconductor portion; a buried compensation structure between the transistor cells and a second surface of the semiconductor portion parallel to the first surface, the compensation structure comprising first areas and second areas alternatingly arranged along a lateral direction parallel to the first surface; and a contiguous impurity layer of a first conductivity type separating the transistor cells and the compensation structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
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Specification