TECHNIQUE FOR FORMING A MEMS DEVICE
First Claim
1. An apparatus formed on a substrate including at least one semiconductor device, the apparatus comprising:
- a microelectromechanical system (MEMS) device comprising at least one of a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer, the second structural layer having a thickness substantially greater than a thickness of the first structural layer.
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Accused Products
Abstract
An apparatus is formed on a substrate including at least one semiconductor device. The apparatus includes a microelectromechanical system (MEMS) device comprising at least one of a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer. The second structural layer has a thickness substantially greater than a thickness of the first structural layer. In at least one embodiment, the MEMS device includes a first portion of the second structural layer and a second portion of the second structural layer. In at least one embodiment, the MEMS device further comprises a gap between the first portion of the second structural layer and the second portion of the second structural layer. In at least one embodiment, the gap has a width at least one order of magnitude less than the thickness of the second structural layer.
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Citations
20 Claims
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1. An apparatus formed on a substrate including at least one semiconductor device, the apparatus comprising:
a microelectromechanical system (MEMS) device comprising at least one of a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer, the second structural layer having a thickness substantially greater than a thickness of the first structural layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. An apparatus comprising:
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an electrode of a microelectromechanical system (MEMS) device formed above a substrate including a semiconductor device; and a member of the MEMS device, the member being formed above the substrate and electrostatically coupled to the electrode, the member including a portion of a first structural layer and a portion of a second structural layer formed above the first structural layer, wherein the portion of the second structural layer has a higher mass than the portion of the first structural layer. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification