REFLECTIVE OPTICAL ELEMENT FOR GRAZING INCIDENCE IN THE EUV WAVELENGTH RANGE
First Claim
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1. An optical element, comprising:
- a substrate; and
a reflecting coating supported by the substrate,wherein the reflecting coating comprises boron, and the reflecting coating has a thickness of more than 50 nm.
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Abstract
An optical element comprises a reflecting coating on a substrate. The reflecting coating contains boron and can have a thickness of more than 50 nm.
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Citations
24 Claims
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1. An optical element, comprising:
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a substrate; and a reflecting coating supported by the substrate, wherein the reflecting coating comprises boron, and the reflecting coating has a thickness of more than 50 nm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. An optical system, comprising:
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an optical element, comprising; a substrate; and a reflecting coating supported by the substrate, wherein the reflecting coating comprises boron, the reflecting coating has a thickness of more than 50 nm, and the optical system is an EUV lithography optical system. - View Dependent Claims (21, 22)
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23. A device, comprising:
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an illumination system; and a projection objective, wherein; the device comprises an optical element; the optical element comprises a substrate and a reflecting layer supported by the substrate; the reflecting coating comprises boron; the reflecting coating has a thickness of more than 50 nm; and the device is an EUV lithography device. - View Dependent Claims (24)
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Specification