METHODS AND SYSTEMS FOR DETERMINING A DOSE-TO-CLEAR OF A PHOTORESIST
First Claim
1. A method of determining a dose-to-clear of a photoresist on a wafer, the method comprising:
- providing an image of the wafer after the photoresist was exposed to a dose of energy and was developed;
transforming the image of the wafer into frequency spectrum data;
calculating an average frequency spectrum component of the frequency spectrum data;
calculating a difference between the average frequency spectrum component and a noise average frequency spectrum component of a noise average frequency spectrum; and
determining a dose-to-clear the photoresist based on the difference between the average frequency spectrum component and the noise average frequency spectrum component.
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Accused Products
Abstract
A method of determining a dose-to-clear of a photoresist on a wafer includes providing an image of the wafer after the photoresist was exposed to a dose of energy and was developed, transforming the image of the wafer into frequency spectrum data, calculating an average frequency spectrum component of the frequency spectrum data, calculating a difference between the average frequency spectrum component and a noise average frequency spectrum component of a noise average frequency spectrum, and determining a dose-to-clear of the photoresist based on the difference between the average frequency spectrum component and the noise average frequency spectrum component.
3 Citations
20 Claims
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1. A method of determining a dose-to-clear of a photoresist on a wafer, the method comprising:
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providing an image of the wafer after the photoresist was exposed to a dose of energy and was developed; transforming the image of the wafer into frequency spectrum data; calculating an average frequency spectrum component of the frequency spectrum data; calculating a difference between the average frequency spectrum component and a noise average frequency spectrum component of a noise average frequency spectrum; and determining a dose-to-clear the photoresist based on the difference between the average frequency spectrum component and the noise average frequency spectrum component. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of determining projection optics flare in a lithographic system, the method comprising:
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determining a dose-to-clear of a photoresist on a wafer, determining the dose-to-clear comprising; providing an image of the wafer after the photoresist was exposed to a dose of energy and was developed; transforming the image of the wafer into frequency spectrum data; calculating an average frequency spectrum component of the frequency spectrum data; calculating a difference between the average frequency spectrum component and a noise average frequency spectrum component of a noise average frequency spectrum; and determining a dose-to-clear the photoresist based on the difference between the average frequency spectrum component and the noise average frequency spectrum component; and determining the projection optics flare based on the dose-to-clear. - View Dependent Claims (11, 12)
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13. A non-transitory computer readable medium storing control logic for operating a computer system, the control logic including control logic instructions for determining a dose-to-clear of a photoresist on a wafer by:
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providing an image of the wafer after the photoresist was exposed to a dose of energy and was developed; transforming the image of the wafer into frequency spectrum data; calculating an average frequency spectrum component of the frequency spectrum data; calculating a difference between the average frequency spectrum component and a noise average frequency spectrum component of a noise average frequency spectrum; and determining a dose-to-clear the photoresist based on the difference between the average frequency spectrum component and the noise average frequency spectrum component. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20)
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Specification