Controlled Ion Implantation Into Silicon Carbide Using Channeling And Devices Fabricated Using Controlled Ion Implantation Into Silicon Carbide Using Channeling
First Claim
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1. A method of forming a semiconductor structure, comprising:
- providing a silicon carbide layer having a crystallographic axis;
heating the silicon carbide layer to a temperature of about 300°
C. or more;
implanting dopant ions into the heated silicon carbide layer at an implant angle between a direction of implantation and the crystallographic axis of less than about 2°
; and
annealing the silicon carbide layer at a time-temperature product of less than about 30,000°
C.-hours to activate the implanted ions.
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Abstract
Methods of forming a semiconductor structure include the use of channeled implants into silicon carbide crystals. Some methods include providing a silicon carbide layer having a crystallographic axis, heating the silicon carbide layer to a temperature of about 300° C. or more, implanting dopant ions into the heated silicon carbide layer at an implant angle between a direction of implantation and the crystallographic axis of less than about 2°, and annealing the silicon carbide layer at a time-temperature product of less than about 30,000° C.-hours to activate the implanted ions.
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Citations
57 Claims
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1. A method of forming a semiconductor structure, comprising:
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providing a silicon carbide layer having a crystallographic axis; heating the silicon carbide layer to a temperature of about 300°
C. or more;implanting dopant ions into the heated silicon carbide layer at an implant angle between a direction of implantation and the crystallographic axis of less than about 2°
; andannealing the silicon carbide layer at a time-temperature product of less than about 30,000°
C.-hours to activate the implanted ions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19-54. -54. (canceled)
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55. An article of manufacture, comprising:
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a silicon carbide layer; an implanted region in the silicon carbide layer containing implanted dopant atoms, wherein the implanted region extends to a depth of from about 2.5 microns to about 4.5 microns into silicon carbide layer and has a doping concentration that varies by less than about 25% from a peak concentration over a depth of at least about 1 micron. - View Dependent Claims (56, 57)
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Specification